Title:
STAGE EQUIPMENT, EXPOSURE EQUIPMENT, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2010/082475
Kind Code:
A1
Abstract:
Disclosed is stage equipment including: a movable member with at least one aperture formed in the surface thereof; and a temperature adjustment device that adjusts the temperature of at least part of the movable member by suction of fluid at the periphery of the aperture through said aperture, so that the fluid flows into a flow path formed within the movable member from the at least one aperture in the movable member.
Inventors:
NAGASAKA HIROYUKI (JP)
SHIRATA YOSUKE (JP)
SHIRATA YOSUKE (JP)
Application Number:
PCT/JP2010/000130
Publication Date:
July 22, 2010
Filing Date:
January 13, 2010
Export Citation:
Assignee:
NIKON CORP (JP)
NAGASAKA HIROYUKI (JP)
SHIRATA YOSUKE (JP)
NAGASAKA HIROYUKI (JP)
SHIRATA YOSUKE (JP)
International Classes:
H01L21/027; G03F7/20; H01L21/68
Foreign References:
| JP2005328051A | 2005-11-24 | |||
| JPH04208551A | 1992-07-30 | |||
| JP2005019864A | 2005-01-20 | |||
| JP2007142238A | 2007-06-07 | |||
| JPH04271108A | 1992-09-28 |
Attorney, Agent or Firm:
SHIGA, Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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