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Patent Searching and Data


Title:
STAMPER FOR MANUFACTURING ANTI-REFLECTION MATERIAL, MANUFACTURING METHOD THEREFOR, AND ANTI-REFLECTION MATERIAL PREPARED BY SAME
Document Type and Number:
WIPO Patent Application WO/2014/142474
Kind Code:
A1
Abstract:
An anti-reflection material of the present invention comprises: a base part made of a transparent material; and a convex part of a fine concave-convex pattern which is protruded on a surface of the base part, wherein the convex part of a fine concave-convex pattern comprises a first convex part of the greatest height; a second convex part of the smallest height, the second convex part being disposed at a distance from the first convex part; and one or more third convex parts of a height which is lower than the first convex part, becomes gradually lower toward the second convex part, and higher than the second convex part, the third convex part being disposed between the first convex part and the second convex part. Due to this structure, the anti-reflection material can exhibit low reflection characteristics with respect to the entire bandwidth of the visible ray.

Inventors:
KIM SANG HEE (KR)
Application Number:
PCT/KR2014/001884
Publication Date:
September 18, 2014
Filing Date:
March 07, 2014
Export Citation:
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Assignee:
TOPNANOIMPRINTING LTD (KR)
International Classes:
G02B1/11; B29C33/38; B29C59/02
Domestic Patent References:
WO2012043607A12012-04-05
Foreign References:
JP2008090212A2008-04-17
JP2009199086A2009-09-03
KR20110036875A2011-04-12
Attorney, Agent or Firm:
LEE, JAE HWA (KR)
이재화 (KR)
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