Title:
SUBSTITUTED CYCLOPENTADIENYL COBALT COMPLEX AND METHOD FOR PRODUCTION THEREOF, AND COBALT-CONTAINING THIN FILM AND METHOD FOR PRODUCTION THEREOF
Document Type and Number:
WIPO Patent Application WO/2017/104619
Kind Code:
A1
Abstract:
Provided is a cobalt complex which is useful for the production of a cobalt-containing thin film under conditions where no oxidizing gas is used.
A cobalt complex represented by general formula (1) (wherein R1 represents a silyloxy group represented by general formula (2) (wherein R6, R7 and R8 independently represent an alkyl group having 1 to 6 carbon atoms); R2 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a silyloxy group represented by general formula (2); R3, R4 and R5 independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and L represents a diene having 4 to 10 carbon atoms) is used.
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Inventors:
KOISO NAOYUKI (JP)
YAMAMOTO YUKI (JP)
OIKE HIROYUKI (JP)
HAYAKAWA TEPPEI (JP)
FURUKAWA TAISHI (JP)
TADA KEN-ICHI (JP)
YAMAMOTO YUKI (JP)
OIKE HIROYUKI (JP)
HAYAKAWA TEPPEI (JP)
FURUKAWA TAISHI (JP)
TADA KEN-ICHI (JP)
Application Number:
PCT/JP2016/086932
Publication Date:
June 22, 2017
Filing Date:
December 12, 2016
Export Citation:
Assignee:
TOSOH CORP (JP)
SAGAMI CHEMICAL RES INST (JP)
SAGAMI CHEMICAL RES INST (JP)
International Classes:
C07F19/00; C07F15/06; C07F17/00; C23C16/18; H01L21/28; H01L21/285
Domestic Patent References:
| WO2015190420A1 | 2015-12-17 |
Foreign References:
| JPH09235287A | 1997-09-09 | |||
| JP2010528183A | 2010-08-19 | |||
| JP2016147819A | 2016-08-18 |
Other References:
ATTILA SISAK: "Silylations of a, beta-unsaturated and aromatic carbonyl compounds with cobalt carbonyls", JOURNAL OF ORGANOMETALLIC CHEMISTRY, vol. 586, no. 1, 1999, pages 48 - 53, XP004177514, ISSN: 0022-328X
See also references of EP 3392259A4
See also references of EP 3392259A4
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