Title:
SUBSTRATE CLEANING DEVICE AND METHOD FOR CLEANING SUBSTRATE USING SAME
Document Type and Number:
WIPO Patent Application WO/2016/086470
Kind Code:
A1
Abstract:
A substrate cleaning device and a method for cleaning a substrate using same. The substrate cleaning device comprises a shield that comprises a top plate, a side wall extending downward from the top plate and a sprinkler arranged in the shield. The width of the shield and the width of the sprinkler cover the width of the substrate, and the side wall extends to the position near the surface of the substrate. When the substrate cleaning device is used for cleaning the substrate, water drop in external environment cannot drop on the substrate, so that the condition that the substrate has different degrees of etching is avoided, and accordingly the problem that irreparable spots appear on a liquid crystal panel is avoided.
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| WO/2014/007429 | CLEANING APPARATUS FOR LIGHT COLLECTING FACILITY |
| JPH0581837 | [Name of invention] Square substrate cleaning device |
| WO/2020/073192 | ULTRASONIC CLEANING MACHINE |
Inventors:
DENG HAIFENG (CN)
Application Number:
PCT/CN2014/094526
Publication Date:
June 09, 2016
Filing Date:
December 22, 2014
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
B08B11/04; B08B3/02; B08B11/00; H01L21/67
Foreign References:
| CN1714952A | 2006-01-04 | |||
| CN1512247A | 2004-07-14 | |||
| CN202316390U | 2012-07-11 | |||
| EP2595178A2 | 2013-05-22 | |||
| JP2011211094A | 2011-10-20 |
Attorney, Agent or Firm:
YUHONG INTELLECTUAL PROPERTY LAW FIRM (CN)
北京聿宏知识产权代理有限公司 (CN)
北京聿宏知识产权代理有限公司 (CN)
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