Title:
SUBSTRATE CLEANING DEVICE, SUBSTRATE PROCESSING DEVICE, ULTRASONIC CLEANING FLUID SUPPLY DEVICE, AND RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2019/150683
Kind Code:
A1
Abstract:
The present invention provides a substrate cleaning device having high cleaning power. In an embodiment, there is provided a substrate cleaning device comprising a substrate rotation mechanism that holds and rotates a substrate, and a nozzle that sprays an ultrasonic cleaning fluid toward the rotated substrate, the nozzle being capable of pivoting within a plane perpendicular to the substrate, and also capable of pivoting within a plane parallel to the substrate.
Inventors:
ISHIBASHI TOMOATSU (JP)
Application Number:
PCT/JP2018/041115
Publication Date:
August 08, 2019
Filing Date:
November 06, 2018
Export Citation:
Assignee:
EBARA CORP (JP)
International Classes:
H01L21/304; B08B1/04; B08B3/12
Domestic Patent References:
| WO2017154673A1 | 2017-09-14 |
Foreign References:
| JP2002043267A | 2002-02-08 | |||
| JP2015103608A | 2015-06-04 | |||
| JP2015233091A | 2015-12-24 | |||
| JP2002093765A | 2002-03-29 |
Attorney, Agent or Firm:
OHNO Seiji et al. (JP)
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