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Patent Searching and Data


Title:
SUBSTRATE CLEANING DEVICE, SUBSTRATE PROCESSING DEVICE, ULTRASONIC CLEANING FLUID SUPPLY DEVICE, AND RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2019/150683
Kind Code:
A1
Abstract:
The present invention provides a substrate cleaning device having high cleaning power. In an embodiment, there is provided a substrate cleaning device comprising a substrate rotation mechanism that holds and rotates a substrate, and a nozzle that sprays an ultrasonic cleaning fluid toward the rotated substrate, the nozzle being capable of pivoting within a plane perpendicular to the substrate, and also capable of pivoting within a plane parallel to the substrate.

Inventors:
ISHIBASHI Tomoatsu (11-1 Haneda Asahi-cho, Ohta-k, Tokyo 10, 〒1448510, JP)
Application Number:
JP2018/041115
Publication Date:
August 08, 2019
Filing Date:
November 06, 2018
Export Citation:
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Assignee:
EBARA CORPORATION (11-1, Haneda Asahi-cho Ohta-k, Tokyo 10, 〒1448510, JP)
International Classes:
H01L21/304; B08B1/04; B08B3/12
Domestic Patent References:
WO2017154673A12017-09-14
Foreign References:
JP2002043267A2002-02-08
JP2015103608A2015-06-04
JP2015233091A2015-12-24
JP2002093765A2002-03-29
Attorney, Agent or Firm:
OHNO Seiji et al. (OHNO & PARTNERS, Marunouchi Kitaguchi Building 21F 6-5, Marunouchi 1-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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