Title:
SUBSTRATE CLEANING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/286635
Kind Code:
A1
Abstract:
A substrate cleaning device comprising a substrate holding unit, a lower surface brush, a first liquid nozzle, and a second liquid nozzle. The substrate holding unit holds the substrate in a horizontal attitude. The lower surface brush is configured to be moveable between a treatment position for cleaning the substrate, and a standby position vertically overlapping the substrate being held by the substrate holding unit. Further, the lower surface brush is configured to be rotatable around a vertical axis. The lower surface brush in the treatment position contacts the lower surface of the substrate to clean the lower surface of the substrate. The first liquid nozzle ejects cleaning fluid onto the central part of the lower surface brush in the standby position. The second liquid nozzle ejects the cleaning fluid onto an end part of the lower surface brush in the standby position.
Inventors:
TAKAHASHI TAKUMA (JP)
SHINOHARA TOMOYUKI (JP)
ISHII JUNICHI (JP)
NAKAMURA KAZUKI (JP)
SHINOHARA TAKASHI (JP)
OKITA NOBUAKI (JP)
OKADA YOSHIFUMI (JP)
SHINOHARA TOMOYUKI (JP)
ISHII JUNICHI (JP)
NAKAMURA KAZUKI (JP)
SHINOHARA TAKASHI (JP)
OKITA NOBUAKI (JP)
OKADA YOSHIFUMI (JP)
Application Number:
PCT/JP2022/026392
Publication Date:
January 19, 2023
Filing Date:
June 30, 2022
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304
Domestic Patent References:
| WO2021053995A1 | 2021-03-25 |
Foreign References:
| JP2020017689A | 2020-01-30 | |||
| JP2021093427A | 2021-06-17 | |||
| JP2019145687A | 2019-08-29 | |||
| JP2003332287A | 2003-11-21 | |||
| JP2017034235A | 2017-02-09 | |||
| JPH06120184A | 1994-04-28 |
Attorney, Agent or Firm:
NAKAGAWA, Masahiro et al. (JP)
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