SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS HAVING SAME, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND LIQUID REPELLENT PLATE

WIPO Patent Application WO/2005/122219

A1

Disclosed is a substrate holder (PH) comprising a base (PHB), a first holding unit (PH1) which is formed on the base (PHB) for suction-holding a substrate (P), and a second holding unit (PH2) which is formed on the base (PHB) for suction-holding a plate member (T) near the substrate (P) suction-held by the first holding unit (PH1). In an exposure apparatus comprising such a substrate holder (PH), plates can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure.

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SHIBAZAKI YUICHI (JP)

PCT/JP2005/010458

December 22, 2005

June 08, 2005

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NIKON CORP (JP)
SHIBAZAKI YUICHI (JP)

G03F7/20; G03F9/00; H01L21/027; H01L21/68; H01L21/683; (IPC1-7): H01L21/027; G03F9/00; H01L21/68

EP1420299A2	2004-05-19
JPH05175098A	1993-07-13
JP2004119497A	2004-04-15
JP2001044097A	2001-02-16
JPH10303114A	1998-11-13
EP1429188A2	2004-06-16
EP1486828A2	2004-12-15
EP1699072A1	2006-09-06
EP1699073A1	2006-09-06
EP1420299A2	2004-05-19

See also references of EP 1788617A4

Kawakita, Kijuro (5-4 Shinjuku 1-chom, Shinjuku-ku Tokyo 22, JP)

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