Title:
SUBSTRATE MANUFACTURING METHOD, SCREEN MASK INSPECTION METHOD, AND SCREEN MASK INSPECTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/250989
Kind Code:
A1
Abstract:
Provided is a substrate manufacturing method, a screen mask inspection method, and a screen mask inspection device that enable defective product generation to be suppressed by inspecting a screen mask after cleaning. A metal mask inspection device 30 comprises: an illumination device 32A that projects light onto a metal mask; a camera 32B that images an aperture of the metal mask; and a control device 33 that processes acquired image data. The control device 33 comprises an AI model 100 that is constructed by training a neural network with, as training data, only image data of a metal mask aperture to which no foreign matter has adhered. The control device: acquires original image data pertaining to the aperture, obtained by imaging the aperture that has been cleaned; acquires reconstructed image data pertaining to the aperture obtained by inputting the original image data to the AI model 100 and reconstructing same; and compares the two image data pieces to determine whether foreign matter has adhered to the inner wall section of the aperture.
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Inventors:
SHINYAMA TAKAYUKI (JP)
KIKUCHI KAZUYOSHI (JP)
OHYAMA TSUYOSHI (JP)
SAKAIDA NORIHIKO (JP)
KIKUCHI KAZUYOSHI (JP)
OHYAMA TSUYOSHI (JP)
SAKAIDA NORIHIKO (JP)
Application Number:
PCT/JP2021/014986
Publication Date:
December 16, 2021
Filing Date:
April 09, 2021
Export Citation:
Assignee:
CKD CORP (JP)
International Classes:
B41F15/08; B41F15/14; B41F35/00; B41M1/12; G06T7/00; H05K3/34
Domestic Patent References:
| WO2016021043A1 | 2016-02-11 |
Foreign References:
| JPH09201953A | 1997-08-05 | |||
| JP2020044733A | 2020-03-26 | |||
| JPH0899401A | 1996-04-16 |
Attorney, Agent or Firm:
KAWAGUCHI Mitsuo (JP)
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