Title:
SUBSTRATE, METHOD FOR EXPOSURE OF SUBSTRATE TO LIGHT, AND PHOTO-ALIGNMENT TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2011/090057
Kind Code:
A1
Abstract:
Disclosed are: a substrate in which all of regions to be exposed to light can be irradiated with a light energy with high accuracy; and a light exposure method.
Using a light exposure device (5) that is equipped with multiple light exposure units (52) each comprising a light source (521) and a mask (522) having, formed therein, a light-transmissive pattern (5221) that can transmit a light energy emitted from the light source (521), a substrate (1) is irradiated with the light energy through the light-transmissive pattern (5221) formed in the mask (522) while moving the substrate (1) and the light exposure units (52) relatively to each other. At the same time, in one of the light exposure units (52) in which the mask (522) straddles a display region (11a) having a predetermined size and a display region (11b) having a different size from the predetermined size, both the display region (11a) having the predetermined size and the display region (11b) having the different size are irradiated with the light energy using an alignment pattern (12) formed on the substrate (1) as a benchmark for the control of alignment of mask (522).
Inventors:
HIRAKO TAKAHIRO
Application Number:
PCT/JP2011/050829
Publication Date:
July 28, 2011
Filing Date:
January 19, 2011
Export Citation:
Assignee:
SHARP KK (JP)
HIRAKO TAKAHIRO
HIRAKO TAKAHIRO
International Classes:
G02F1/1337; G02F1/13; G03F9/00; G09F9/00; G09F9/30
Domestic Patent References:
| WO2008108032A1 | 2008-09-12 | |||
| WO2006132369A1 | 2006-12-14 |
Foreign References:
| JP2004177942A | 2004-06-24 | |||
| JP2009198535A | 2009-09-03 | |||
| JPS603609A | 1985-01-10 |
Attorney, Agent or Firm:
UENO, NOBORU (JP)
Ueno 登 (JP)
Ueno 登 (JP)
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Claims: