Title:
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFERRING METHOD
Document Type and Number:
WIPO Patent Application WO/2006/070630
Kind Code:
A1
Abstract:
A substrate processing apparatus is provided with a carrier placing section for placing a carrier, which stores a plurality of substrates at a fixed pitch by directing main planes of the substrates in a fixed direction; a processing section for performing prescribed processing to the substrate; a holder for storing the substrates at a prescribed pitch in a processing section; and a substrate transferring apparatus for carrying in/out the substrates to/from the carrier placed on the carrier placing section and the holder one by one, and transferring the substrates between the carrier and the holder. The substrate transferring apparatus can hold the substrate on a discretionary side of either the main plane side or the rear plane side for carrying out the substrate from the carrier so that the substrates stored in the carrier are carried onto the holder in a previously set direction.
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Inventors:
KAMIKAWA YUJI (JP)
EGASHIRA KOJI (JP)
EGASHIRA KOJI (JP)
Application Number:
PCT/JP2005/023257
Publication Date:
July 06, 2006
Filing Date:
December 19, 2005
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
KAMIKAWA YUJI (JP)
EGASHIRA KOJI (JP)
KAMIKAWA YUJI (JP)
EGASHIRA KOJI (JP)
International Classes:
H01L21/677
Foreign References:
| JPH07307374A | 1995-11-21 | |||
| JP2003264215A | 2003-09-19 | |||
| JPH09312329A | 1997-12-02 | |||
| JPH10125761A | 1998-05-15 | |||
| JP2002124556A | 2002-04-26 |
Attorney, Agent or Firm:
Takayama, Hiroshi (10-8 Akasaka 2-chom, Minato-ku Tokyo 52, JP)
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