SUBSTRATE PROCESSING APPARATUS

Title:

SUBSTRATE PROCESSING APPARATUS

Document Type and Number:

WIPO Patent Application WO/2023/038370

Kind Code:

A1

Abstract:

The present invention relates to a substrate processing apparatus comprising: a chamber; a substrate support part which supports at least one substrate in the chamber; a lower plate which is disposed above the substrate support part; and an upper plate which is disposed above the lower plate, wherein: the upper plate includes a first spray hole which provides a first gas and a second spray hole which provides a second gas; and the lower plate includes a first opening which is disposed under the first spray hole so as to allow the first gas provided from the first spray hole to pass therethrough and a second opening which is disposed under the second spray hole so as to allow the second gas provided from the second spray hole to pass therethrough.

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Inventors:

KIM JUN YOUNG (KR)
CHA SANG YUN (KR)
LEE JI HUN (KR)
JANG DAE SOO (KR)

Application Number:

PCT/KR2022/013189

Publication Date:

March 16, 2023

Filing Date:

September 02, 2022

Export Citation:

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Assignee:

JUSUNG ENG CO LTD (KR)

International Classes:

C23C16/455; C23C16/509; H01J37/32

Foreign References:

US20170002463A1	2017-01-05
KR20120028963A	2012-03-23
KR20200024364A	2020-03-06
KR102198929B1	2021-01-06
US20080178807A1	2008-07-31

Attorney, Agent or Firm:

ASTRAN INT'L IP GROUP (KR)

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