SUBSTRATE PROCESSING DEVICE AND METHOD FOR MAINTAINING SAME

WIPO Patent Application WO/2013/161519

A1

Provided is a substrate processing device in which the arrangement space for the substrate processing device including the working space can be effectively utilized in an instance in which a plurality of processing chambers are provided. The substrate processing device is provided with: a first processing chamber; a second processing chamber; a transportation chamber; a frame structure; and an elevating part. Each of the first processing chamber and the second processing chamber has a main body part and a lid part, and demarcates a processing space in the interior. The transportation chamber is connected to the first processing chamber and the second processing chamber and houses a transportation mechanism for transporting the substrate. The frame structure has a pair of column parts and a beam part supported by the top of each of the column parts. The elevating part is attached to the beam part so as to be capable of moving in the horizontal direction, and moves the lid part in the vertical direction. The beam part extends across the regions above the first processing chamber, the second processing chamber, and the transportation chamber.

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SENZAKI SHIGERU (JP)
SAITO MICHISHIGE (JP)
SATOH DAIKI (JP)
HORIUCHI KEN (JP)
ANDO KOHJI (JP)
KOIWA SHINGO (JP)

PCT/JP2013/059981

October 31, 2013

April 01, 2013

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TOKYO ELECTRON LTD (JP)

H01L21/02

JPH10326844A	1998-12-08
JP2004311887A	2004-11-04
JP2007165659A	2007-06-28

HASEGAWA Yoshiki et al. (JP)
Yoshiki Hasegawa (JP)

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