Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/107048
Kind Code:
A1
Abstract:
This substrate processing device includes: a chamber; a substrate retention unit that is accommodated within the chamber and is for retaining a substrate; and a TDLAS gas concentration measurement unit that includes a light-emitting section comprising a light-emitting diode, a light-receiving section comprising a light-receiving diode for receiving light from the light-emitting diode, and a TDLAS gas concentration measurement section for measuring, by TDLAS scheme, the concentration of a predetermined species of gas contained in the atmosphere surrounding an optical path which is formed between the light-emitting diode and the light-receiving diode and which is disposed so as to pass through a predetermined region within the chamber.
Inventors:
INOUE MASAFUMI (JP)
FUJIKI HIROYUKI (JP)
FUKATSU EIJI (JP)
FUJIKI HIROYUKI (JP)
FUKATSU EIJI (JP)
Application Number:
PCT/JP2018/040409
Publication Date:
June 06, 2019
Filing Date:
October 30, 2018
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304
Foreign References:
| JP2009200193A | 2009-09-03 | |||
| JP2017157800A | 2017-09-07 | |||
| US20080123712A1 | 2008-05-29 |
Attorney, Agent or Firm:
AI ASSOCIATION OF PATENT AND TRADEMARK ATTORNEYS (JP)
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