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Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/027734
Kind Code:
A1
Abstract:
This substrate processing device includes: a mount table on which a substrate is mounted in a processing container; a partition having a diameter which is smaller than that of the inner side surface of the processing container and is larger than that of the substrate mounted on the mount table; a service port provided on a side wall of the processing container; a first seal mechanism provided on the processing container at a position corresponding to the service port; and a second seal mechanism provided on the partition at a position facing the service port. A first seal surface of the first seal mechanism and a second seal surface of the second seal mechanism are provided so as to make contact with each other when the partition is moved to a substrate processing position.

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Inventors:
HAYASHI KAZUICHI (JP)
Application Number:
PCT/JP2015/072745
Publication Date:
February 25, 2016
Filing Date:
August 11, 2015
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/302; H01L21/3065; H01L21/683
Foreign References:
JP2005054254A2005-03-03
JP2003100721A2003-04-04
JPH05179436A1993-07-20
JP2009054720A2009-03-12
JP2011146434A2011-07-28
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
Tetsuo Kanamoto (JP)
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