Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/137646
Kind Code:
A1
Abstract:
Provided is technology for reducing the amount of contamination of a substrate transported after a heating process. This substrate processing device 1 has an indexer unit ID and a processing unit PU. The processing unit PU has a fluid processing unit 30, a heating process unit 40, a shuttle transporting mechanism 50, a first transport robot 60, and a second transport robot 70. The indexer unit ID supplies the processing unit PU with a substrate W accommodated in a carrier C. The heating process unit 40 is provided between the indexer unit ID and the fluid processing unit 30. The substrate W supplied from the indexer unit ID is transported, by the shuttle transporting mechanism 50, the first transport robot 60, and the second transport robot 70, to the indexer unit ID, the fluid processing unit 30, the heating process unit 40, and the indexer unit ID in this order.
Inventors:
KIKUMOTO NORIYUKI (JP)
HASHIMOTO KOJI (JP)
AMAHISA KENJI (JP)
TOMITA TSUYOSHI (JP)
TAKAYAMA YUICHI (JP)
HASHIMOTO KOJI (JP)
AMAHISA KENJI (JP)
TOMITA TSUYOSHI (JP)
TAKAYAMA YUICHI (JP)
Application Number:
PCT/JP2019/049110
Publication Date:
July 02, 2020
Filing Date:
December 16, 2019
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304; H01L21/677
Foreign References:
| JP2016103597A | 2016-06-02 | |||
| JP2017162978A | 2017-09-14 | |||
| JP2016219471A | 2016-12-22 | |||
| JP2010225935A | 2010-10-07 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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