Title:
SUBSTRATE TREATMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/085990
Kind Code:
A1
Abstract:
The present invention relates to a substrate treatment apparatus comprising: a process chamber; a first electrode positioned in the upper part of the process chamber; a second electrode positioned below the first electrode and including a plurality of openings; a plurality of protruding electrodes extending from the first electrode to the plurality of openings of the second electrode; and a substrate support part facing the second electrode and supporting a substrate.
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Inventors:
SA SEUNG YOUB (KR)
LEE JI HUN (KR)
JANG DAE SOO (KR)
JEON BU IL (KR)
LEE JI HUN (KR)
JANG DAE SOO (KR)
JEON BU IL (KR)
Application Number:
PCT/KR2021/013582
Publication Date:
April 28, 2022
Filing Date:
October 05, 2021
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
H01J37/32; H01L21/67
Foreign References:
| KR20190122577A | 2019-10-30 | |||
| KR20150004542A | 2015-01-13 | |||
| KR102061749B1 | 2020-01-02 | |||
| KR20140006505A | 2014-01-16 | |||
| JP2011054950A | 2011-03-17 |
Attorney, Agent or Firm:
ASTRAN INT'L IP GROUP (KR)
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