Title:
SUBSTRATE TREATMENT DEVICE ARRANGED INSIDE PROCESS CHAMBER AND METHOD FOR OPERATING SAME
Document Type and Number:
WIPO Patent Application WO/2016/182299
Kind Code:
A1
Abstract:
An embodiment of a substrate treatment device may comprise: a disk provided to be able to rotate; at least one susceptor arranged on the disk, a substrate being seated on the upper surface of the susceptor, the susceptor rotating, as the disk rotates, and revolving about the center of the disk as the axis; a metal ring coupled to the lower portion of the susceptor and arranged such that the center of the metal ring coincides with the center of the susceptor; and a magnet arranged radially on the lower portion of the disk with reference to the center of the disk and provided such that at least a part of the magnet faces the metal ring in the up/down direction.
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Inventors:
KIM KI BUM (KR)
SA SEUNG YOUB (KR)
WOO RAM (KR)
LEE MYUNG JIN (KR)
CHOI SEUNG DAE (KR)
CHOI JONG SUNG (KR)
HER HO BOEM (KR)
SA SEUNG YOUB (KR)
WOO RAM (KR)
LEE MYUNG JIN (KR)
CHOI SEUNG DAE (KR)
CHOI JONG SUNG (KR)
HER HO BOEM (KR)
Application Number:
PCT/KR2016/004842
Publication Date:
November 17, 2016
Filing Date:
May 10, 2016
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
H01L21/683; H01L21/02; H01L21/67; H01L21/687
Foreign References:
| KR20130061802A | 2013-06-12 | |||
| KR20090116236A | 2009-11-11 | |||
| JP2009206288A | 2009-09-10 | |||
| KR20090079510A | 2009-07-22 | |||
| KR20110116901A | 2011-10-26 |
Attorney, Agent or Firm:
PARK, Young Bok et al. (KR)
박영복 (KR)
박영복 (KR)
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