Title:
SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM WHICH STORES SUBSTRATE TREATMENT PROGRAM
Document Type and Number:
WIPO Patent Application WO/2013/042726
Kind Code:
A1
Abstract:
The present invention provides a substrate treatment device (1) for treating a substrate (2) in a substrate treatment chamber (7), in which a cover (5) of a carrier (3) loaded onto a carrier loading base (6) is opened and the substrate (2) housed in the carrier (3) is transported to the substrate treatment chamber (7), a substrate treatment method and a substrate treatment program. If (a) specific condition(s) is(are) fulfilled when a first carrier (3) loaded onto the carrier loading base (6) is being treated, the cover (5) of the second carrier (3) is opened and treatment of the substrate (2) starts.
Inventors:
NASU MASAHIRO (JP)
ITOU KOUICHI (JP)
WADA SHIGEKI (JP)
OKAMURA KOUJI (JP)
ITOU KOUICHI (JP)
WADA SHIGEKI (JP)
OKAMURA KOUJI (JP)
Application Number:
PCT/JP2012/074061
Publication Date:
March 28, 2013
Filing Date:
September 20, 2012
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
NASU MASAHIRO (JP)
ITOU KOUICHI (JP)
WADA SHIGEKI (JP)
OKAMURA KOUJI (JP)
NASU MASAHIRO (JP)
ITOU KOUICHI (JP)
WADA SHIGEKI (JP)
OKAMURA KOUJI (JP)
International Classes:
H01L21/677; H01L21/304
Foreign References:
| JP2008130634A | 2008-06-05 | |||
| JP2006269810A | 2006-10-05 | |||
| JP2002009131A | 2002-01-11 | |||
| JP2009099710A | 2009-05-07 | |||
| JP2012231117A | 2012-11-22 |
Attorney, Agent or Firm:
KATSUNUMA Hirohito et al. (JP)
Katsunuma Hirohito (JP)
Katsunuma Hirohito (JP)
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Claims:
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