Title:
SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2016/175488
Kind Code:
A1
Abstract:
The present invention provides a substrate treatment device and a substrate treatment method, the device comprising: a chamber; a susceptor positioned on the lower part of the chamber and having at least one substrate loaded therein; a chamber lead positioned on the upper part of the susceptor; a first source gas spray provided in the chamber lead so as to spray source gas; and a second source gas spray provided in the chamber lead so as to spray source gas, wherein a first purge gas spray provided in the chamber lead and spraying purge gas is provided between the first and second source gas sprays.
Inventors:
HAN TAE SEONG (KR)
KANG DAE BONG (KR)
KWAK JAE CHAN (KR)
KIM KA LAM (KR)
KIM DOO YOUNG (KR)
SEO DONG WON (KR)
LEE SANG DU (KR)
LEE SEONG KWANG (KR)
CHO BYOUNG HA (KR)
CHUN DONG SEOK (KR)
HWANG CHUL JOO (KR)
KANG DAE BONG (KR)
KWAK JAE CHAN (KR)
KIM KA LAM (KR)
KIM DOO YOUNG (KR)
SEO DONG WON (KR)
LEE SANG DU (KR)
LEE SEONG KWANG (KR)
CHO BYOUNG HA (KR)
CHUN DONG SEOK (KR)
HWANG CHUL JOO (KR)
Application Number:
PCT/KR2016/004024
Publication Date:
November 03, 2016
Filing Date:
April 18, 2016
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
H01L21/02; H01L21/205; H01L21/3065; H01L21/67; H01L21/683
Foreign References:
| KR20140101049A | 2014-08-19 | |||
| KR20140049170A | 2014-04-25 | |||
| KR20130133622A | 2013-12-09 | |||
| KR20100078333A | 2010-07-08 | |||
| JP2009147372A | 2009-07-02 |
Attorney, Agent or Firm:
ASTRAN INT'L IP GROUP (KR)
특허법인 천문 (KR)
특허법인 천문 (KR)
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