Title:
SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2018/150628
Kind Code:
A1
Abstract:
This substrate treatment device includes a front surface cleaning section, a rear surface cleaning section, and a destaticizing unit. The front surface of a substrate is to be cleaned by means of a front surface cleaning unit, and the rear surface of the substrate is to be cleaned by means of a rear surface cleaning unit. A substrate to be cleaned by the front surface cleaning unit and/or a substrate having been cleaned by the front surface cleaning unit is destaticized by means of the destaticizing unit. A substrate to be cleaned by the rear surface cleaning unit and/or a substrate having been cleaned by the rear surface cleaning unit is destaticized by means of the destaticizing unit. When destaticizing the substrate by means of the destaticizing unit, the substrate is held by a holding section in an atmosphere containing oxygen molecules. The substrate held by the holding section is irradiated with vacuum ultraviolet light through the atmosphere containing oxygen molecules.
Inventors:
WAJIKI TAKEHIRO (JP)
MITSUHASHI TSUYOSHI (JP)
MITSUHASHI TSUYOSHI (JP)
Application Number:
PCT/JP2017/037048
Publication Date:
August 23, 2018
Filing Date:
October 12, 2017
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/304; H01L21/02
Foreign References:
| JP2001179198A | 2001-07-03 | |||
| JP2001293443A | 2001-10-23 | |||
| JP2011204944A | 2011-10-13 |
Attorney, Agent or Firm:
FUKUSHIMA, Yoshito (JP)
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