SURFACE TREATING AGENT FOR PATTERN FORMATION

Title:

SURFACE TREATING AGENT FOR PATTERN FORMATION

Document Type and Number:

WIPO Patent Application WO/2006/129800

Kind Code:

A1

Abstract:

Disclosed is a surface treating agent for photolithography containing at least one of a fluorine monomer (A) described below and a fluorine polymer (B) containing the fluorine monomer. The fluorine monomer (A) is at least one fluorine monomer selected from (A-1) an a-substituted acrylate containing a fluoroalkyl group having 1-6 carbon atoms; (A-2) a fluorine-containing silsesquioxane monomer containing a fluoroalkyl group having 1-6 carbon atoms and a polymerizable group; (A-3) a polymerizable monomer containing a perfluoropolyether group; (A-4) a monomer wherein a fluoroalkyl group having 1-6 carbon atoms and a polymerizable group are linked by -SO₂(CH₂)_n- (wherein n is 1-10); and (A-5) a macromonomer containing at least one of the monomers (A-1)-(A-4) as a repeating unit and having a (meth)acryloyl group at a polymer end. This surface treating agent provides a liquid repellent region with sufficiently high water repellency and oil repellency even thought it has a short-chain Rf group (short-chain fluoroalkyl group) having 6 or less carbon atoms.

More Like This:

WO/2010/024087	PHOTOSENSITIVE ADHESIVE COMPOSITION, AND FILM ADHESIVE, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER AND SEMICONDUCTOR DEVICE USING THE PHOTOSENSITIVE ADHESIVE COMPOSITION
JP2022075182	ENERGY-SENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR FORMING PATTERNED CURED PRODUCT
JP2008107779	PHOTOSENSITIVE TRANSFER MATERIAL, RIB AND METHOD FOR FORMING THE SAME, COLOR FILTER AND METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICE

Inventors:

MORITA MASAMICHI (JP)
ISHIKAWA TAKUJI (JP)
YAMASHITA TSUNEO (JP)

Application Number:

PCT/JP2006/311111

Publication Date:

December 07, 2006

Filing Date:

June 02, 2006

Export Citation:

Click for automatic bibliography generation Help

Assignee:

DAIKIN IND LTD (JP)
MORITA MASAMICHI (JP)
ISHIKAWA TAKUJI (JP)
YAMASHITA TSUNEO (JP)

International Classes:

G03F7/004; G02B5/20; G03F7/027; G03F7/033; G03F7/038; G03F7/039; G03F7/075; H01L21/027

Foreign References:

JP2005023234A	2005-01-27
JP2004004227A	2004-01-08
JP2004272227A	2004-09-30
JP2004277494A	2004-10-07
JP2004151618A	2004-05-27
JP2003228164A	2003-08-15
JPH0954432A	1997-02-25
JPH05255496A	1993-10-05
JP2005043876A	2005-02-17
JP2004109887A	2004-04-08
JP2002040650A	2002-02-06
JP2004016922A	2004-01-22
JP2003188073A	2003-07-04

Attorney, Agent or Firm:

Kawamiya, Osamu (IMP Building 3-7, Shiromi 1-chome, Chuo-ku, Osaka-sh, Osaka 01, JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: PLATE MATERIAL CUTTING UNIT, CUTTING DEVICE HAVING THE CUTTING UNIT, AND CUTTING FACILITY HAVING THE...

Next Patent: FORM PANEL DOUBLING AS SUBSTRATE FOR INTERIOR AND EXTERIOR MATERIALS AND FORM CONSTRUCTION METHOD FO...