TARGET SUPPLY DEVICE, PROCESSING DEVICE AND PROCESSING METHOD THEREFOR

Title:

TARGET SUPPLY DEVICE, PROCESSING DEVICE AND PROCESSING METHOD THEREFOR

Document Type and Number:

WIPO Patent Application WO/2016/121040

Kind Code:

A1

Abstract:

The target supply device in one embodiment of the present invention is a target supply device for supplying a metal target to a plasma generation region, and may be equipped with a tank housing the metal target, a dehydrated filter for suppressing the passage therethrough of a particle that is in the metal target housed inside the tank, and a nozzle having a nozzle hole formed therein for ejecting the metal target that has passed through the filter.

More Like This:

WO/2017/076427	DRIVER LASER ASSEMBLY, EUV RADIATION-GENERATING DEVICE COMPRISING THE DRIVER LASER ASSEMBLY, AND METHOD FOR AMPLIFYING LASER PULSES
JP4685943	Lithography equipment, lighting systems, and methods of supplying projected beams of EUV radiation

Inventors:

HORI TSUKASA (JP)
SHIRAISHI YUTAKA (JP)
IKESAKA SHINYA (JP)
ISHIHARA TAKANOBU (JP)
UMEKI TOSHIRO (JP)

Application Number:

PCT/JP2015/052408

Publication Date:

August 04, 2016

Filing Date:

January 28, 2015

Export Citation:

Click for automatic bibliography generation Help

Assignee:

GIGAPHOTON INC (JP)

International Classes:

H05G2/00

Domestic Patent References:

WO2014024865A1

2014-02-13

Foreign References:

JP2013070040A	2013-04-18
JP2008063569A	2008-03-21
JP2013140771A	2013-07-18
JP2014056891A	2014-03-27
JP2008226462A	2008-09-25
JP2014517980A	2014-07-24
JP2010199560A	2010-09-09

Attorney, Agent or Firm:

EBISU International Patent Office (JP)
Patent business corporation エビス international patent firm (JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: METHOD FOR FORMING MULTILAYERED COATING FILM, AND MULTILAYERED COATING FILM

Next Patent: WIRELESS COMMUNICATION SYSTEM, BASE STATION APPARATUS AND TERMINAL APPARATUS