Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
TEMPERATURE MEASURING METHOD, EXPOSURE METHOD, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2007/066687
Kind Code:
A1
Abstract:
Disclosed is an exposure apparatus comprising a holding member (10) for holding a substrate (P), and a sensing unit (20) for optically obtaining information on the temperature of the holding member (10) by receiving a sensing light (21L) from the holding member (10).

Inventors:
NAGASAKA HIROYUKI (JP)
Application Number:
PCT/JP2006/324361
Publication Date:
June 14, 2007
Filing Date:
December 06, 2006
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NIKON CORP (JP)
NAGASAKA HIROYUKI (JP)
International Classes:
H01L21/027; G01B11/00; G03F7/20
Foreign References:
JP2006324361A2006-11-30
JP2004301825A2004-10-28
JP7112000B22022-08-03
JPH10189424A1998-07-21
JPS6258141A1987-03-13
Attorney, Agent or Firm:
SHIGA, Masatake et al. (Yaesu Chuo-k, Tokyo 53, JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: OPTICAL NONLINEAR EVALUATION DEVICE AND OPTICAL SWITCHING ELEMENT

Next Patent: RADIO BASE STATION, WIRELESS COMMUNICATION TERMINAL, WIRELESS COMMUNICATION METHOD, AND WIRELESS COM...