Title:
THERMAL PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/055879
Kind Code:
A1
Abstract:
A plurality of halogen lamps for pre-heating a semiconductor wafer are arrayed in a lattice in two upper and lower levels, forming a rectangular light source area. Two auxiliary lamps are arranged at each of the four corners of the rectangular light source area. The outputs of the auxiliary lamps are controlled separately. When the semiconductor wafer is pre-heated using the plurality of halogen lamps, the temperature at the peripheral portions of the semiconductor wafer opposite the four corners of the rectangular light source area are separately adjusted by the auxiliary lamps. In this way, during the pre-heating with the halogen lamps, the temperature at the peripheral portions of the semiconductor wafer including the portions opposite the four corners can be appropriately adjusted, and the in-plane temperature distribution of the semiconductor wafer can be made uniform during pre-heating.
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Inventors:
FURUKAWA MASASHI (JP)
KAWARAZAKI HIKARU (JP)
UEDA AKITSUGU (JP)
KAWARAZAKI HIKARU (JP)
UEDA AKITSUGU (JP)
Application Number:
PCT/JP2017/025386
Publication Date:
March 29, 2018
Filing Date:
July 12, 2017
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/26; H01L21/265
Foreign References:
| JP2005108967A | 2005-04-21 | |||
| JP2009200401A | 2009-09-03 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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