Title:
THERMOSETTING RESIN FILM, AND FIRST PROTECTIVE FILM-FORMING SHEET
Document Type and Number:
WIPO Patent Application WO/2019/098329
Kind Code:
A1
Abstract:
Provided is a thermosetting resin film (12) which is applied to a surface of a semiconductor wafer which has bumps, and thermoset to form a first protective film on said surface, wherein the minimum value of the shear viscosity of the thermosetting resin film (12) at 90-130˚C is at least 500 Pa∙s when the temperature of the thermosetting resin film (12) before being thermoset is raised by 10˚C/min. Also provided is a first protective film-forming sheet (1) which is provided with a first support sheet (101), and which has, provided on one surface (101a) of the first support sheet (101), the thermosetting resin film (12).
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Inventors:
SHINOMIYA KEISUKE (JP)
SATO AKINORI (JP)
YAMAGISHI MASANORI (JP)
SATO AKINORI (JP)
YAMAGISHI MASANORI (JP)
Application Number:
PCT/JP2018/042489
Publication Date:
May 23, 2019
Filing Date:
November 16, 2018
Export Citation:
Assignee:
LINTEC CORP (JP)
International Classes:
C08J5/18; H01L21/60; H01L23/29; H01L23/31
Domestic Patent References:
WO2017078039A1 | 2017-05-11 |
Foreign References:
JP2017092461A | 2017-05-25 | |||
JP2017188306A | 2017-10-12 | |||
JP2015131969A | 2015-07-23 | |||
JP2018093120A | 2018-06-14 |
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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