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Patent Searching and Data


Title:
THICKNESS MEASURING METHOD, X-RAY ANALYSIS DEVICE, INFORMATION PROCESSING DEVICE, AND COMPUTER PROGRAM
Document Type and Number:
WIPO Patent Application WO/2024/004990
Kind Code:
A1
Abstract:
Provided are a thickness measuring method, an X-ray analysis device, an information processing device, and a computer program that can measure the thicknesses of more multilayer samples as compared to conventional means. This thickness measuring method comprises: irradiating a sample including a first layer and a second layer which are laminated, with X-rays such that the X-rays transmit through the first layer and the second layer in the stated order; detecting fluorescent X-rays generated from the first layer; detecting transmitting X-rays that have transmitted through the sample; identifying the density of the first layer and the absorption coefficient of X-rays at the first layer through elementary analysis based on the fluorescent X-rays; and calculating the thickness of the first layer on the basis of the absorption coefficient and the density, and the intensities of the transmitting X-rays at two different energies.

Inventors:
OHASHI SATOSHI (JP)
MIYAMOTO SHOHEI (JP)
AOYAMA TOMOKI (JP)
MIYASAKA SHINTARO (JP)
NAGURA MAKOTO (JP)
HIROSE JUN (JP)
MATSUNAGA DAISUKE (JP)
Application Number:
PCT/JP2023/023738
Publication Date:
January 04, 2024
Filing Date:
June 27, 2023
Export Citation:
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Assignee:
HORIBA LTD (JP)
International Classes:
G01B15/02; G01N23/087; G01N23/223
Foreign References:
JPS6138509U1986-03-11
JPS6391506A1988-04-22
JPH0394444A1991-04-19
Attorney, Agent or Firm:
KOHNO, Hideto et al. (JP)
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