THIN FILM FORMATION METHOD AND COATED GLASS

Title:

THIN FILM FORMATION METHOD AND COATED GLASS

Document Type and Number:

WIPO Patent Application WO/2015/076210

Kind Code:

A1

Abstract:

The present invention relates to a method for forming a TiO2 thin film on a SnO2 thin film, which is formed on a substrate, employing an atmospheric pressure CVD method, wherein a raw material gas comprises titanium tetraisopropoxide (TTIP) and a tin chloride, wherein the tin chloride is contained in such an amount that the ratio of the concentration of the tin chloride to the concentration of titanium tetraisopropoxide (TTIP) (i.e., (tin chloride (mol%))/(TTIP(mol%)) becomes 0.02 to 0.1.

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Inventors:

MATSUI YUJI (JP)
USUI REO (JP)
SEKI ATSUSHI (JP)
IWAOKA HIROAKI (JP)

Application Number:

PCT/JP2014/080253

Publication Date:

May 28, 2015

Filing Date:

November 14, 2014

Export Citation:

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Assignee:

ASAHI GLASS CO LTD (JP)

International Classes:

C23C16/40; C03C17/245

Domestic Patent References:

WO2013008894A1	2013-01-17
WO2011013719A1	2011-02-03

Foreign References:

JP2005119920A	2005-05-12
JPH08176826A	1996-07-09
JP2004507430A	2004-03-11
JP2002509516A	2002-03-26
JP2008164680A	2008-07-17
JP2004507430A	2004-03-11
JP2002509516A	2002-03-26

Other References:

YOSHITAKE MASUDA; KAZUMI KATO, CHEM. MATER., vol. 20, 2008, pages 1057 - 1063
See also references of EP 3072991A4

Attorney, Agent or Firm:

HAMADA Yuriko et al. (JP)
Yuriko Hamada (JP)

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