Title:
TRANSFER CHAMBER
Document Type and Number:
WIPO Patent Application WO/2016/136431
Kind Code:
A1
Abstract:
A transfer chamber is provided in which a chemical filter can be changed without affecting the internal atmosphere and which can abbreviate or eliminate the time during which operations for transferring a wafer W are stopped when the chemical filter is changed. This transfer chamber, which uses a transfer robot 2 provided inside the transfer chamber to transfer a wafer W to or from a processing device 6, is provided with a circulation path CL1 which is formed inside the transfer chamber for circulating a gas, a chemical filter unit 7 which is provided midstream in the circulation path CL1, and a connection and separation means 8 which switches between separating and connecting the chemical filter unit 7 and the circulation path CL1.
Inventors:
KAWAI TOSHIHIRO (JP)
SHIGETA TAKASHI (JP)
KOMIYA MUNEKAZU (JP)
TANIYAMA YASUSHI (JP)
SHIGETA TAKASHI (JP)
KOMIYA MUNEKAZU (JP)
TANIYAMA YASUSHI (JP)
Application Number:
PCT/JP2016/053553
Publication Date:
September 01, 2016
Filing Date:
February 05, 2016
Export Citation:
Assignee:
SINFONIA TECHNOLOGY CO LTD (JP)
International Classes:
H01L21/677; B01D53/04; B65G49/07; F24F7/003; F24F7/06; F24F13/28
Foreign References:
| JP2014112631A | 2014-06-19 | |||
| JP2003314873A | 2003-11-06 | |||
| JPH0938449A | 1997-02-10 |
Other References:
See also references of EP 3264450A4
Attorney, Agent or Firm:
ONISHI, Masanao (JP)
Onishi Masanao (JP)
Onishi Masanao (JP)
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