Title:
TRANSFER CHAMBER
Document Type and Number:
WIPO Patent Application WO/2016/136432
Kind Code:
A1
Abstract:
A transfer chamber is provided which maintains the removal function for removing chemical components by means of a chemical filter by suitably maintaining the internal humidity and which enables transferring an article to be transferred in a clean state. This transfer chamber, which uses a transfer robot 2 provided inside the transfer chamber to transfer a wafer W as the article to be transferred to or from a processing device 6, is provided with a circulation path CL which is formed inside the transfer chamber for circulating a gas, a chemical filter unit 7 as a chemical filter provided midstream in the circulation path CL, a humidity detector HG2 as a humidity detection means that detects the internal humidity, and gas supply means NS for supplying a gas internally, and a moisture supply means HS for supplying moisture internally, wherein the moisture supply means HS is actuated on the basis of a moisture detection value from the moisture detection means.
Inventors:
KAWAI TOSHIHIRO (JP)
SHIGETA TAKASHI (JP)
KOMIYA MUNEKAZU (JP)
TANIYAMA YASUSHI (JP)
SHIGETA TAKASHI (JP)
KOMIYA MUNEKAZU (JP)
TANIYAMA YASUSHI (JP)
Application Number:
PCT/JP2016/053554
Publication Date:
September 01, 2016
Filing Date:
February 05, 2016
Export Citation:
Assignee:
SINFONIA TECHNOLOGY CO LTD (JP)
International Classes:
H01L21/677; H01L21/02
Foreign References:
| JP2005283049A | 2005-10-13 | |||
| JP2004311940A | 2004-11-04 | |||
| JP2012094822A | 2012-05-17 |
Other References:
See also references of EP 3264451A4
Attorney, Agent or Firm:
ONISHI, Masanao (JP)
Onishi Masanao (JP)
Onishi Masanao (JP)
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