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Title:
TREATMENT CONDITION DECISION METHOD, TREATMENT CONDITION DECISION SYSTEM, TREATMENT SYSTEM, TREATMENT CONDITION DECISION CALCULATOR PROGRAM, PROGRAM RECORDING MEDIUM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2003/078104
Kind Code:
A1
Abstract:
In step (S11), amounts (parameters) to be varied are respectively varied by a predetermined pitch and standard treatment conditions are decided by combining the parameters. For each of the standard treatment conditions, treatment is performed actually and the treatment shape obtained is made to be a standard treatment shape corresponding to the standard treatment condition (step 12). When an appropriate simulation program is available, it is possible to obtain a standard treatment shape by simulation without performing the treatment actually. The standard treatment conditions and the standard treatment shapes thus obtained are stored in a storage device. When a target shape to be obtained by treatment is given in step (S13), a standard treatment shape similar to the target shape is searched in step (S14). Thus, when a treatment shape is given, the corresponding treatment condition can be decided.

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Inventors:
SENGA TATSUYA (JP)
USHIO YOSHIJIRO (JP)
Application Number:
PCT/JP2003/003304
Publication Date:
September 25, 2003
Filing Date:
March 19, 2003
Export Citation:
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Assignee:
NIPPON KOGAKU KK (JP)
SENGA TATSUYA (JP)
USHIO YOSHIJIRO (JP)
International Classes:
B24B37/04; B24B49/00; H01L21/768; H01L21/3105; H01L21/321; (IPC1-7): B24B49/10; B23Q15/00; B24B37/00; H01L21/304
Foreign References:
EP1092505A22001-04-18
US5599423A1997-02-04
JPH0459126A1992-02-26
Attorney, Agent or Firm:
Hosoe, Toshiaki (Nishikanagawa 1-Chome Kanagawa-ku Yokohama-Shi, Kanagawa, JP)
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