TREATMENT DEVICE AND TREATMENT METHOD, AND GAS CLUSTER GENERATION DEVICE AND GENERATION METHOD

WIPO Patent Application WO/2016/158054

A1

The present invention is provided with: a treatment container (1) in which an object to be treated (S) is disposed and held in a vacuum; an exhaust-gas mechanism (6) for evacuating the interior of the treatment container (1); a gas supply unit (12) for supplying gas including cluster generation gas for generating gas clusters; a cluster nozzle (11) provided inside the treatment container (1), for adiabatically expanding in the interior thereof the cluster generation gas supplied from the gas supply unit (12) and generating gas clusters, and spraying a gas component including the generated gas clusters into the treatment container (1); and a plasma generation mechanism (22) for generating plasma in a portion of the cluster nozzle (11), gas clusters being ionized by the plasma generated in the cluster nozzle portion, and the ionized gas clusters being sprayed from the cluster nozzle (11) and irradiated onto the object to be treated (S) to perform a prescribed treatment.

JP2009262016	METHOD OF SEPARATING CARBON DIOXIDE AND SEPARATING APPARATUS AND WASHING APPARATUS
JPH02211626	PLASMA CLEANING
JPH06338483	WAFER GRINDING METHOD

DOBASHI KAZUYA (JP)
KOSHIMIZU CHISHIO (JP)

PCT/JP2016/054524

October 06, 2016

February 17, 2016

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TOKYO ELECTRON LTD (JP)

H01L21/304; H01L21/302; H05H1/46

JP2008063590A	2008-03-21
JPH11293469A	1999-10-26
JP2007066796A	2007-03-15

TAKAYAMA HIROSHI (JP)
Hiroshi Takayama (JP)

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