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Title:
TWO-STAGE DRYING AND GASIFICATION INTEGRATION DEVICE AND METHOD OF ORGANIC SUBSTANCE
Document Type and Number:
WIPO Patent Application WO/2012/122700
Kind Code:
A1
Abstract:
A two-stage drying and gasification integration device and method of organic substance include a gasification device, two-stage drying devices, a gas purification device, a gas storage device, a gas boiler and an air preheater. In the two-stage drying processes of organic substance, one stage drying device utilizes high temperature combustible gas generated by gasification of organic substance as a drying medium to dry organic substance, while the other stage drying device uses saturation water vapor as a drying medium to dry organic substance. The organic substance after the two-stage drying processes becomes a solid fuel for a gasification reaction. The sensible heat of high temperature combustible gas generated by gasification and the calorific value of the combustible gas itself are made to be the energy source of the two-stage drying processes. The device and method enable the combination of two-stage drying processes and gasification process of organic substance, making effective use of the calorific value contained in organic substance, and enable zero external energy supply, effectively solving the problem of gas purification.

Inventors:
LI AIMIN (CN)
GAO NINGBO (CN)
WANG WEIYUN (CN)
Application Number:
PCT/CN2011/071790
Publication Date:
September 20, 2012
Filing Date:
March 15, 2011
Export Citation:
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Assignee:
UNIV DALIAN TECH (CN)
LI AIMIN (CN)
GAO NINGBO (CN)
WANG WEIYUN (CN)
International Classes:
F26B21/00; C10J3/06; C10J3/20; C10J3/84; C10K1/00; C10K1/02; C10K1/32
Foreign References:
JP2006075693A2006-03-23
CN2910920Y2007-06-13
JP2005265273A2005-09-29
US20050145578A12005-07-07
Other References:
WANG, WEIYUN ET AL.: "A Comprehensive Treatment Process of Drying Gasification and Burning of Dewatered Sludge", CHEMICAL INDUSTRY AND ENGINEERING PROGRESS, vol. 29, 15 August 2010 (2010-08-15), pages 245 - 246
Attorney, Agent or Firm:
PATENT CENTER OF DUT (CN)
大连理工大学专利中心 (CN)
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Claims: