Title:
UPPER LAYER FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING PHASE SEPARATED PATTERN
Document Type and Number:
WIPO Patent Application WO/2021/251295
Kind Code:
A1
Abstract:
Provided is an upper layer film-forming composition which exhibits good solubility in hydrophobic solvents and can bring about vertical alignment of a block copolymer without dissolution, swelling or the like of a layer containing the block copolymer formed on a substrate. This upper layer film-forming composition is used for phase separation of a layer containing a block copolymer formed on a substrate, and contains: (A) a copolymer containing a unit structure derived from a maleimide structure (a) and a unit structure derived from a styrene structure; and (B) as a solvent, a non-aromatic hydrocarbon compound that is a liquid at normal temperature and pressure.
Inventors:
MIZUOCHI RYUTA (JP)
SHIMIZU SHO (JP)
TAMURA MAMORU (JP)
SHIMIZU SHO (JP)
TAMURA MAMORU (JP)
Application Number:
PCT/JP2021/021393
Publication Date:
December 16, 2021
Filing Date:
June 04, 2021
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08F212/04; C08F222/40; H01L21/027; H01L21/3065; H01L21/312
Domestic Patent References:
| WO2020017494A1 | 2020-01-23 | |||
| WO2017188031A1 | 2017-11-02 |
Foreign References:
| JPH07278232A | 1995-10-24 | |||
| JPH0337257A | 1991-02-18 | |||
| JPH0687932A | 1994-03-29 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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