Title:
VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK DEVICE, METHOD FOR PRODUCING VAPOR DEPOSITION MASK, METHOD FOR PRODUCING VAPOR DEPOSITION MASK DEVICE, AND VAPOR DEPOSITION METHOD
Document Type and Number:
WIPO Patent Application WO/2020/032149
Kind Code:
A1
Abstract:
This vapor deposition mask is provided with: a mask which has a plating layer in which a first through hole is formed; and a supporting body which is bonded to the mask, and in which a second through hole is formed, said second through hole overlapping with the first through hole when viewed in plan.
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Inventors:
HOSODA TETSUSHI (JP)
MURATA YOSHINORI (JP)
MURATA YOSHINORI (JP)
Application Number:
PCT/JP2019/031281
Publication Date:
February 13, 2020
Filing Date:
August 07, 2019
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| WO2016111214A1 | 2016-07-14 | |||
| WO2018110253A1 | 2018-06-21 |
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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