Title:
VAPOR DEPOSITION MASK, MANUFACTURING METHOD FOR VAPOR DEPOSITION MASK, AND MANUFACTURING METHOD FOR DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/074104
Kind Code:
A1
Abstract:
The vapor deposition mask is provided with: an obverse surface; a reverse surface located on the side opposite from the obverse surface; and inner surfaces that each demarcates a mask hole. Each mask hole penetrates between the obverse surface and the reverse surface. In plan view of the obverse surface, each mask hole has a large opening located on the obverse surface and a small opening located on the inside of the large opening. At least a part of each mask hole has an inverted cylindrical frustum-like shape connecting the large opening with the small opening. Each of the inner surfaces has a stepped surface expanding from the small opening toward the large opening.
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Inventors:
NISHI TAKEHIRO (JP)
Application Number:
PCT/JP2018/038126
Publication Date:
April 18, 2019
Filing Date:
October 12, 2018
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD (JP)
International Classes:
C23C14/04; C23C14/24; G09F9/00; H01L27/32; H01L51/50; H05B33/10
Domestic Patent References:
| WO2017168773A1 | 2017-10-05 | |||
| WO2015072251A1 | 2015-05-21 | |||
| WO2017179677A1 | 2017-10-19 |
Foreign References:
| JP2009041054A | 2009-02-26 | |||
| JP2010216000A | 2010-09-30 | |||
| JP2015214741A | 2015-12-03 | |||
| JP2009074160A | 2009-04-09 |
Attorney, Agent or Firm:
ONDA, Makoto et al. (JP)
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