VAPOR PROCESSING DEVICE AND METHOD FOR PRODUCING VAPOR PROCESSED PRODUCT

WIPO Patent Application WO/2023/248735

A1

The present invention provides a vapor processing device that carries out processing in which a to-be-processed object having fluidity and comprising an aggregate of a plurality of unit objects is exposed to water vapor to change the characteristics of the to-be-processed object, the vapor processing device comprising a processing unit which is a container having an upper portion and a lower portion and in which the to-be-processed object is accommodated to carry out the processing. The processing unit comprises: a to-be-processed object introduction unit that introduces the to-be-processed object into the processing unit from above; a pressure adjustment unit that discharges gas to the outside of the processing unit from above to adjust the internal pressure; a vapor introduction unit that introduces the water vapor into the processing unit from below; and a liquid discharge unit that discharges an internal liquid to the outside of the processing unit from below. In the vapor introduction unit, an outlet portion through which the water vapor is released into the processing unit is provided in a region where the accommodated to-be-processed object is present inside the processing unit.

OHTANI MASAYUKI (JP)
SAKO AKIHIRO (JP)
TAKASE TOMOHIKO (JP)
TSUTSUMI RYUICHI (JP)

PCT/JP2023/020171

December 28, 2023

May 30, 2023

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HISAKA WORKS LTD (JP)

A47J27/16; A23L7/10

JP2001145568A	2001-05-29
JPS485193Y1	1973-02-09
JP2006068456A	2006-03-16
JPH1118946A	1999-01-26
JPS0314292Y1
JPH0324027U	1991-03-13
JPS6063121U	1985-05-02
JPS5356368A	1978-05-22
JPH01304856A	1989-12-08
JPH04129510A	1992-04-30
JPH07184776A	1995-07-25
JPH06209851A	1994-08-02

MIYAZONO Hirokazu (JP)

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