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Patent Searching and Data


Title:
WATER VAPOR TREATMENT DEVICE AND PRODUCTION METHOD FOR WATER VAPOR-TREATED PRODUCT
Document Type and Number:
WIPO Patent Application WO/2023/248736
Kind Code:
A1
Abstract:
The present invention pertains to a water vapor treatment device for performing a treatment in which a treatment target object that is fluidic and is composed of an aggregate of multiple unit objects is exposed to water vapor so as to alter characteristics thereof. The device comprises a treatment unit that is a container which has an upper section and a lower section and in which the treatment target object is accommodated and said treatment is performed. The treatment unit comprises: a treatment target object introduction part for introducing the treatment target object to the inside from the top side of the treatment unit; a pressure adjustment part for adjusting the inside pressure by discharging gas to the outside from the top side of the treatment unit; a water vapor introduction part for introducing the water vapor to the inside from the bottom side of the treatment unit; a drainage part for draining internal liquid to the outside from the bottom side of the treatment unit; and an additive liquid introduction part for introducing, to the inside, an additive liquid for reforming the treatment target object or for promoting the treatment.

Inventors:
OHTANI MASAYUKI (JP)
SAKO AKIHIRO (JP)
TAKASE TOMOHIKO (JP)
TSUTSUMI RYUICHI (JP)
Application Number:
PCT/JP2023/020172
Publication Date:
December 28, 2023
Filing Date:
May 30, 2023
Export Citation:
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Assignee:
HISAKA WORKS LTD (JP)
International Classes:
A47J27/16; A23L7/10
Foreign References:
JPH11244143A1999-09-14
JP2006068456A2006-03-16
JP2001145568A2001-05-29
JPS4916589U1974-02-12
JPH11253311A1999-09-21
JPH08280535A1996-10-29
JPH06209851A1994-08-02
JPH0324027U1991-03-13
Attorney, Agent or Firm:
MIYAZONO Hirokazu (JP)
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