Title:
WASTE LIQUID STORAGE DEVICE AND WET ETCHING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2019/033307
Kind Code:
A1
Abstract:
A waste liquid storage device (10) and a wet etching system having the waste liquid storage device (10), for storing a waste liquid (20) generated by wet etching. The waste liquid (20) comprises a first solute (22) and a second solute (24), and the second solute (24) is a catalyst for an exothermic oxidation reaction of the first solute (22). The waste liquid storage device (10) comprises a first liquid storage tank (11) and a first conduit (12) for connecting an external complexant solution source (30) with the first liquid storage tank (11). The first liquid storage tank (11) is used for storing the waste liquid (20), the first conduit (12) is used for channeling a complexant (32) to the first liquid storage tank (11), and the complexant (32) is used to inhibit the catalytic ability of the second solute (24) for reaction of the first solute (22). The wet etching system (100) comprises a wet etching machine (40) for etching workpieces and generating the waste liquid (20), and the waste liquid storage device (10).
Inventors:
XU RUI (CN)
CAO FEI (CN)
ZHONG RENCONG (CN)
CAO FEI (CN)
ZHONG RENCONG (CN)
Application Number:
PCT/CN2017/097696
Publication Date:
February 21, 2019
Filing Date:
August 16, 2017
Export Citation:
Assignee:
SHENZHEN ROYOLE TECHNOLOGIES CO LTD (CN)
International Classes:
C02F9/06; B65D88/54; C02F1/72
Foreign References:
| CN205974105U | 2017-02-22 | |||
| CN104087938A | 2014-10-08 | |||
| CN103864247A | 2014-06-18 | |||
| CN205035099U | 2016-02-17 | |||
| JP2003166081A | 2003-06-13 |
Attorney, Agent or Firm:
TSINGYIHUA INTELLECTUAL PROPERTY LLC (CN)
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