Title:
WATER-REPELLENT COMPOSITION, WATER-REPELLENT THIN FILM, AND THIN FILM WITH WATER-REPELLENT/HYDROPHILIC PATTERN
Document Type and Number:
WIPO Patent Application WO/2005/119367
Kind Code:
A1
Abstract:
A water-repellent composition from which a thin film having a water-repellent/hydrophilic pattern can be easily formed with the aid of a light having relatively low energy. The water-repellent composition comprises a water-repellent compound (A) which decomposes by the action of an acid to come to have reduced water repellency (e.g., Rf2OCOR3Si(R4)3-mX2m, wherein Rf2 is monovalent polyfluoroalkyl, R3 is alkylene, R4 is methyl, X is a hydrolyzable group, and m is an integer of 1-3) and a compound (B) which decomposes upon irradiation with a light having a wavelength of 200 nm or longer to generate an acid. A thin film formed from the composition is irradiated with a light to form a thin film having a water-repellent/hydrophilic pattern.
Inventors:
FURUKAWA YUTAKA (JP)
OKAZOE TAKASHI (JP)
OKAZOE TAKASHI (JP)
Application Number:
PCT/JP2005/009479
Publication Date:
December 15, 2005
Filing Date:
May 24, 2005
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
FURUKAWA YUTAKA (JP)
OKAZOE TAKASHI (JP)
FURUKAWA YUTAKA (JP)
OKAZOE TAKASHI (JP)
International Classes:
G03F7/004; B05D3/06; C09D183/08; G03F7/075; H01L21/027; B05D5/08; (IPC1-7): G03F7/004; H01L21/027
Foreign References:
| JPH08320562A | 1996-12-03 | |||
| JP2003195502A | 2003-07-09 | |||
| JP2000298345A | 2000-10-24 | |||
| JP2003241386A | 2003-08-27 | |||
| JPH0112894A | ||||
| JPH10301265A | 1998-11-13 | |||
| JPH10114888A | 1998-05-06 |
Attorney, Agent or Firm:
Senmyo, Kenji (38 Kanda-Higashimatsushitach, Chiyoda-ku Tokyo 42, JP)
Download PDF:
Previous Patent: METHOD FOR PRE-EXPOSING RELIEF IMAGE PRINTING PLATE
Next Patent: SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM
Next Patent: SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM