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JP2016155206A |
To prevent a plate material contacting with a polishing brush from moving, resulting in a failure to polish the plate material.In a polishing method of polishing a plate material with a brush, the plate material is held on a holding surf...
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JP5976243B1 |
[Subject] Cleaning of a field to be cleaned can be performed without spoiling the feeling which is grasped single hand and wiped by hand, and even if it demonstrates the function which the fluid for cleaning is made to permeate, the mous...
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JP2016525023A |
A device (1) for polishing the metal surface (2) of a metal strip (3), the device having a motor (4) and a rotating shaft (5) coupled to the motor, and rotating. A rotating pan (6) made of rubber elastic material and a polishing cloth (8...
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JP2016144329A |
To provide an electrical wire brush for an indirect hot-line work that can facilitate polishing of a core wire of an electrical wire.An electrical wire brush 10 includes a frame 1 and a movable jaw 2. A frame 1 has a connection metal fit...
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JP5959284B2 |
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JP5947221B2 |
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JP2016119368A |
To provide a compact conditioning device capable of performing the conditioning of more than one type.A conditioning device for conditioning a buff pad for use in buff processing includes a base plate configured rotatably, a first condit...
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JP2016117144A |
To provide a polishing device that is suitable for polishing an end surface of a rod-shaped abrasive sample made of fiber-reinforced polymer composite materials, without using adhesives and an embedding process.A polishing jig 40 include...
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JP3205051U |
[Subject] A polish unit which can be adjusted and a polish device of polish power are provided. [Means for Solution] A principal axis with which it is polish unit 10 attached to a deburring machine or a polish device and which rotational...
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JP5928373B2 |
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JP5926078B2 |
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JP5918799B2 |
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JP2016078232A |
To provide a polishing device which can freely set a width and position of polishing on the inner peripheral surface of a tire.A polishing device comprises a polishing mechanism 401 that polishes the inner peripheral surface of a tire, a...
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JP5911750B2 |
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JP5911674B2 |
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JP5913559B2 |
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JP2016055364A |
To provide a polishing pad capable of obtaining sufficient polishing accuracy, when being used for mirror finish polishing.A polishing pad 1 is pasted with a polishing film 9 on an outer peripheral surface of a circular center base mater...
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JP5906335B1 |
[Subject] It is high precision, and it is efficient and performs polish processing to various-shaped parts to be polish. [Means for Solution] A polish device of the present invention is provided with the following. A base metal member wh...
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JP5902000B2 |
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JP2016043471A |
To provide a substrate processing apparatus which enables improvement of a washing degree of a table to which a substrate is attached during polishing and a backing material.A buff processing module 300A is an apparatus for performing bu...
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JP2016043472A |
To provide a substrate processing apparatus and a substrate processing method which enable improvement of a washing degree of a table to which a substrate is attached during polishing and a backing material.A buff processing module 300A ...
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JP5896131B2 |
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JP5889471B1 |
To provide a surface treatment apparatus capable of linearly moving a machining tool for deburring, edge finishing of a cut end, or polishing the surface of a product. A machining tool 35 is attached to an attachment 41a of an endless ro...
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JP5882947B2 |
The invention is directed to a chemical-mechanical polishing pad substrate comprising a porous material having an average pore size of about 0.01 microns to about 1 micron. The polishing pad substrate has a light transmittance of about 1...
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JP5873785B2 |
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JP3202507U |
To provide an apparatus for processing a flat glass surface to a different degree of opacity or correcting a sandblasted glass surface. A device for modifying a flat glass surface 5, a means for supplying water for cooling and washing th...
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JP5843155B2 |
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JP5842920B2 |
Provided is a system for grinding/polishing hard and brittle materials, said system being provided with a grinding function for making cross-sectional dimensions of a subject to be processed composed of hard and brittle materials within ...
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JP5840210B2 |
A method for adjusting a predetermined contour of a turbine blade root including a main salient edge defined by a determined interior angle. The method includes: chamfering the main edge of the contour to obtain two auxiliary salient edg...
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JP2015221408A |
To provide a method for coating an automotive body, capable of reducing dust and particle failure by removing foreign objects adhering to the automotive body before an intermediate/finish coating step.A method for coating an automotive b...
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JP5813532B2 |
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JP2015196202A |
To reduce contact resistance between a cathode beam and a bus-bar provided above a tank wall of an electrolysis tank.In the polishing device, a polishing part 40 polishes only a part of the cathode beam 136 coming into contact with the b...
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JP3200289U |
To provide a highly efficient steel pipe polishing sander machine. The upper rack 1, the lower rack 10, and the support 9 installed between the upper rack and the lower rack are included. There is a first screw 4 in the upper rack, and a...
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JP5771551B2 |
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JP5758005B2 |
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JP2015131362A |
To provide a processing method and a processing tool of a work piece reducing a period of time of a production cycle and improving productivity.A processing tool 1 comprises: a plurality of brushes 3 and 3 rotationally driven so as to de...
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JP5749420B2 |
A method of manufacturing a chemical-mechanical polishing (CMP) pad comprises the steps of (a) forming a layer of a polymer resin liquid solution (i.e., a polymer resin dissolved in a solvent); (b) inducing a phase separation in the laye...
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JP5741227B2 |
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JP5738232B2 |
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JP2015091610A |
To provide a glass plate end surface treatment method capable of polishing an end surface of a glass plate efficiently, and improving intensity of the end surface of the glass plate.Plural glass substrates 10 are laminated for forming a ...
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JP5708899B2 |
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JP5704242B2 |
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JP2015071213A |
To provide a buff polishing device which can achieve stabilization of polishing quality and improvement in productivity by preventing the uneven wear of a buff roll in advance.A buff control device 1 comprises: a holding base 10 for hold...
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JP2015066643A |
To provide a mirror polishing method and a mirror polishing device in which generation of buff burning can be avoided and in which time needed for mirror polishing becomes too long can be avoided.At a polishing stand table 6, provided ar...
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JP5697912B2 |
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JP5678898B2 |
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JP5675136B2 |
The invention is directed to a chemical-mechanical polishing pad substrate comprising a porous material having an average pore size of about 0.01 microns to about 1 micron. The polishing pad substrate has a light transmittance of about 1...
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JP2015024481A |
To provide a rust removing unit capable of greatly reducing labor and time, compared to a conventional technique of manually removing rust on the outer peripheral surface of a bolt and the vicinity of the bottom with a wire brush.A rust ...
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JP2015016532A |
To provide a stranded wire polishing machine capable of sufficiently removing an oxide film of a metal stranded wire in a short time.A stranded wire polishing machine 1 has a brush 2, a drive part 3, a body 4, and a support part 5. The d...
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JP2015011743A |
To provide a method of manufacturing a glass substrate for an information recording medium capable of obtaining a glass substrate for an information recording medium whose inner peripheral end surface and outer peripheral end surface are...
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