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WO/2024/155533A1 |
A system for polishing a hardmask comprises a composition comprising a permanganate ion of a permanganate oxidizer; a substrate comprising a hardmask that comprises at least one of a non-carbon boron component, a boron-carbon component, ...
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WO/2024/154662A1 |
The purpose of the present invention is to provide a sealing agent for a liquid crystal display element that has excellent moisture permeation resistance and adhesion to an alignment film, and in which peeling of the photocured material ...
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WO/2024/154500A1 |
Provided is a copolymer formed of hydrophilic trialkoxysilane and oleophobic trialkoxysilane. In a preferred mode, a structural unit deriving from the hydrophilic trialkoxysilane constitutes 50 mol%-90 mol% and a structural unit deriving...
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WO/2024/150361A1 |
This water-repellent coating film comprises: spherical particles; inorganic fine particles having an average particle size that is less than the average particle size of the spherical particles; inorganic nano-particles having minute rec...
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WO/2024/150518A1 |
A surface modifier containing, as an active ingredient, a condensation reaction product of a perfluoropolyether group-containing silane compound and a silicate oligomer at a mass ratio of 40:60 to 10:90, wherein the perfluoropolyether gr...
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WO/2024/118543A3 |
Described are concepts, systems, methods, and machines for providing a device (e.g., electronic device) on a transferable, ultra-thin substrate. The described concepts, systems, methods, and machines may be used to produce an electronic ...
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WO/2024/150799A1 |
The present disclosure provides a composite material which contains a fluoropolyether group-containing silane compound and a depolymerizable polymer.
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WO/2024/147287A1 |
The present invention provides: an active light sensitive or radiation sensitive resin composition with which a pattern having excellent resolution can be formed; a resist film; a pattern forming method; and a method for producing an ele...
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WO/2024/142729A1 |
The present invention addresses the problem of providing a resin composition with which a sealing material having high adhesion strength to a hydrophobic member such as an alignment film and having high moisture resistance can be formed....
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WO/2024/142767A1 |
The present invention relates to: a rubber composition for a seal material, the rubber composition containing a crosslinkable rubber component and a donor-acceptor type molecule compound; a seal material containing a crosslinked product ...
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WO/2024/143505A1 |
Provided are a viscosity adjustment agent, an adhesion improvement agent, and a non-water-based paint composition including these, which, in a non-water-based paint, can suppress a decrease in adhesion between layers that is caused by th...
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WO/2024/143054A1 |
A seal material 1a has a thickness t of 1-40 mm. The seal material 1a has a surface section 10e. The surface section 10e includes an edge surface 11 in the thickness direction of the seal material 1a and has a thickness of 300 μm. The s...
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WO/2024/143275A1 |
Provided is a water-repellent and oil-resistant agent that has, as a whole, a high biobased carbon content, and that is capable of imparting sufficient water repellency and/or oil resistance to an object to be treated. Furthermore, provi...
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WO/2024/143404A1 |
The present invention provides a silane compound represented by formula (1) [wherein R1 represents R2-O-CO-, R2-COO-, CH2=CH-, NHR3-, CR5 3-, CHR5 2-, CH2R5- or a halogen atom; R2 represents a hydrogen atom or a C1-6 alkyl group; R3 repr...
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WO/2024/143471A1 |
One embodiment of the present invention provides an antifouling member, one surface of which is provided with a relief structure on the order of nanometers, and which comprises antifouling layers that are provided on the recessed parts o...
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WO/2024/140062A1 |
Provided are a thioxanthenium salt photoinitiator, and a preparation method therefor and the use thereof. The thioxanthenium salt photoinitiator has a structure as represented by formula I. The preparation method comprises the following ...
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WO/2024/140063A1 |
Provided in the present application are a thioxanthene sulfonium salt photoinitiator as well as a preparation method therefor and the use thereof. The thioxanthene sulfonium salt photoinitiator has a structure as shown in following formu...
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WO/2024/142790A1 |
The present invention provides: a water repellent oil repellent composition which has excellent processing stability and excellent product stability (more specifically, long-term storage stability), while using a silicone compound that h...
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WO/2024/143479A1 |
In the first aspect of the present invention, a method for manufacturing an antifouling member is provided, comprising: a step of providing nano-order irregularities on one surface of a base material; and a step for forming an antifoulin...
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WO/2024/143028A1 |
Provided are: a novel heavy metal treatment agent having an improved performance in the treatment of elements in Groups 6-16 of the Periodic Table or compounds thereof, including wastewater treatment, incineration ash treatment, and so f...
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WO/2024/139394A1 |
Provided in the present application is a composition. The composition comprises colloidal silicon dioxide and a pH regulator, wherein the Zeta potential value of the colloidal silicon dioxide is negative, the composition is acidic, and t...
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WO/2024/142722A1 |
The purpose of the present invention is to provide: a polishing material which can achieve a high selectivity ratio between a silicon oxide film and a stopper film while maintaining the polishing speed of the silicon oxide film; an addit...
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WO/2024/143106A1 |
Conventional well-known alkyl-bromide-compound-containing liquid compositions have the problem that metal corrosion is likely to occur when stabilizer content is reduced, thereby making it difficult to control metal corrosion suppression...
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WO/2024/143131A1 |
The purpose of the present invention is to provide: an actinic ray-sensitive or radiation-sensitive resin composition which has excellent LWR performance and enables the reduction of residues after development; a resist film, a pattern f...
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WO/2024/143946A1 |
The present invention provides surface-modified abrasive particles and a polishing slurry composition comprising same, the abrasive particles having improved polishing performance for an insulating film and a metal film and having high-t...
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WO/2024/135255A1 |
The present invention is a water repellent composition that contains (A) an organohydrogenpolysiloxane represented by average composition formula (1) and having a viscosity at 25°C of 5 to 1,000 mPa∙s: 100 mass parts, (B) an organopol...
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WO/2024/135299A1 |
Provided is a liquid leakage repair composition that contains rubber, particles, a polymerizable compound, a tackifier, and a photopolymerization initiator. The difference (A-B) between the refractive index A of the particles and the ref...
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WO/2024/135323A1 |
The purpose of the present disclosure is to provide a new surface treatment method for a display panel provided to an electronic device. This treatment method for a display panel provided to an electronic device comprises: irradiating,...
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WO/2024/137576A1 |
Azeotrope or azeotrope-like compositions and, in particular, azeotrope or azeotrope-like compositions consisting essentially of, or consisting of, (Z)-1-chloro- 2,3,3-trifluoroprop-1-ene (HCFO-1233yd(Z)) with each of ethanol and methanol...
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WO/2024/136366A1 |
The present invention relates to a deicing or anti-icing composition containing a glycol-based compound and a silane-based compound, and a deicing or anti-icing method using same. The composition exhibits an excellent effect of delaying ...
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WO/2024/137901A1 |
The present disclosure relates to a multilayer laminate structure may include a glass substrate having a thickness of not greater than about 300 microns, a fluoropolymer based layer, and an encapsulant layer in contact with the fluoropol...
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WO/2024/135544A1 |
This polishing material achieves a high level of smoothness and improves the amount of polishing per unit time. A polishing material (1) contains amorphous carbon (10), water (12), and an acid (14) other than a polymeric acid. The conten...
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WO/2024/135470A1 |
Provided are: an ultraviolet light absorbing agent in which a slope to the long-wavelength side of the absorption peak thereof is steep (the absolute value of the slope is large) and which efficiently absorbs light from a long-wavelength...
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WO/2024/135527A1 |
The present disclosure relates to a sealing material composition for high pressure hydrogen gas, the sealing material composition containing 100 parts by mass of a perfluoro elastomer and 5-60 parts by mass of a filler, wherein the fille...
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WO/2024/135400A1 |
The present invention provides a curable resin composition which contains capsules and is capable of maintaining sealability at a screwed part of a screwing member in an endurance test such as a heat cycle test. The present invention pro...
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WO/2024/136148A1 |
The present invention relates to diamond grit and a manufacturing method therefor and provides a tetrakaidecahedron diamond grit with a uniform size and shape. The manufacturing method for the diamond grit according to the present invent...
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WO/2024/135362A1 |
This surface treatment agent contains a fluorine-containing coating agent composition which contains a fluoropolyether group-containing polymer represented by general formula (1) and/or a partial(hydrolysis) condensate thereof and (B) a ...
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WO/2024/131596A1 |
A method and an apparatus for waste liquid recycling with optical inspection are provided. The method includes: establishing a plurality of statistical criteria (30); capturing an image of a waste liquid in a transparent pipeline (31); p...
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WO/2024/129467A1 |
A chemical mechanical planarization composition for polishing molybdenum comprising a water based liquid carrier; abrasive particles dispersed in the liquid carrier; an amine compound with an acid group selected from the group consisting...
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WO/2024/129383A1 |
Synthesis of dicationic polymer or copolymer is disclosed. The dicationic polymer or copolymer are formed by at least one dicationic(or dual-cationic) monomer. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activato...
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WO/2024/128199A1 |
A releaser composition for photoirradiation release, and an adhesive composition for photoirradiation release, the releaser composition and the adhesive composition containing: a novolac resin having at least one of a hydroxy group direc...
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WO/2024/128149A1 |
The present invention provides a means for achieving a cured product which has high adhesion to at least one kind of metal and high resistance to coolants. Provided is a curable resin composition which contains components (A)-(C). Comp...
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WO/2024/128017A1 |
Provided is a new sulfonium salt that, when being irradiated with light beams having an ultrashort wavelength, quickly degrades and generates an acid. This sulfonium salt is represented by formula (1). In formula (1), R1 represents an ...
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WO/2024/129859A1 |
The subject application relates to a silicone-based sealant that may be formed from a two-part forming mixture. The two-part forming mixture may include a first component and a second component that chemically reacts with the first compo...
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WO/2024/128192A1 |
This polishing composition is used for polishing a resin and contains water, alumina abrasive grains, and an anionic surfactant, wherein the anionic surfactant has two or more benzene rings.
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WO/2024/129435A1 |
Colloidally stable amphiphilic abrasive particle dispersion containing amphiphilic abrasive particles is provided. The surface of each colloidally stable amphiphilic abrasive particle comprises hydrophilic moieties and hydrophobic moieti...
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WO/2024/124372A1 |
Provided in the present invention are a polyurethane adhesive, a formaldehyde-additive-free presswood pallet, and a preparation method therefor. The present invention relates to the technical field of adhesives for presswood pallets. The...
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WO/2024/127938A1 |
This liquid leakage-repairing method comprises: a first actinic ray-curable resin layer formation step for forming a first actinic ray-curable resin layer in a seamless state on an object to be repaired in such a manner that a portion of...
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WO/2024/125473A1 |
The present invention provides a finish polishing composition, the composition comprising: cerium oxide abrasive particles, an anionic polymer, a cationic polymer, a nitrogen-containing heterocyclic carboxylic acid, and a nonionic surfac...
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WO/2024/127255A1 |
An abrasive article is presented that includes a backing, a make coat applied on the backing, and a plurality of shaped abrasive particles embedded in the make coat. A coat weight of the plurality of shaped abrasive particles is greater ...
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