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WO/2024/091104A1 |
Provided are cerium oxide particles for chemical-mechanical polishing and a chemical-mechanical polishing slurry composition comprising same. By combining the cerium oxide particles that are characteristic of the present invention with a...
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WO/2024/091103A1 |
Provided are cerium oxide particles for chemical-mechanical polishing and a chemical-mechanical polishing slurry composition comprising same. By combining the cerium oxide particles that are characteristics of the present invention with ...
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WO/2024/091100A1 |
Provided are cerium oxide particles for chemical mechanical polishing and a chemical mechanical polishing slurry composition comprising same. A combination of the characteristic cerium oxide particles of the present invention with a dish...
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WO/2024/089919A1 |
This method selects a raw material for obtaining abrasive grains, wherein the raw material includes cerium, and the raw material is selected on the basis of an average value of the positron lifetime measured by positron annihilation spec...
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WO/2024/090423A1 |
The purpose of the present invention is to provide: a composition which contains a novel compound that has excellent handling properties; and a production method, use or the like of this composition. The present invention provides a (met...
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WO/2024/089923A1 |
Provided is a selection method for a raw material for obtaining abrasive grains, wherein the raw material contains cerium, and the raw material is selected on the basis of a peak top temperature in a differential curve of a thermogravime...
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WO/2024/091102A1 |
Provided are cerium oxide particles for chemical-mechanical polishing and a slurry composition for chemical-mechanical polishing comprising same. By means of a combination of cerium oxide particles, the characteristic of the present inve...
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WO/2024/089920A1 |
This method is for selecting abrasive grains containing cerium, and involves selecting the abrasive grains on the basis of the average positron lifetime as measured by a positron annihilation method. Abrasive grains according to the pres...
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WO/2024/089921A1 |
Provided is a selection method for abrasive grains, wherein the abrasive grains contain cerium and the abrasive grains are selected on the basis of the crystallite diameter thereof. Also provided are abrasive grains containing cerium and...
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WO/2024/091105A1 |
Provided are: cerium oxide particles for chemical mechanical polishing; and a slurry composition for chemical mechanical polishing comprising same. Provided are: a slurry composition for chemical mechanical polishing that can significant...
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WO/2024/091101A1 |
Provided are: chemical mechanical polishing cerium oxide particles; and a chemical mechanical polishing slurry composition containing same. Provided are the chemical mechanical polishing slurry composition and a method for manufacturing ...
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WO/2024/090041A1 |
Provided are a radioactive-ray-sensitive resin composition and a pattern formation method that make it possible to form a resist film that has satisfactory storage stability, and also has excellent sensitivity and LWR performance when ne...
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WO/2024/091214A1 |
A deicing and snow melting device, for lowering the melting point of ice and snow, comprises of a plurality of pellets including an active ingredient. Each pellet of the plurality of pellets has at least an underside and a topside. The a...
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WO/2024/090372A1 |
Provided is a novel oilproofing agent that is capable of imparting oil resistance to a base material, the oilproofing agent containing a compound expressed by the formula: [in the formula, Y− is a counter anion, X is a direct bond or a...
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WO/2024/089922A1 |
Provided is a selection method for abrasive grains, wherein the abrasive grains contain cerium and are selected on the basis of a short-life component value of the positron lifetime measured by means of a positron annihilation method. Pr...
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WO/2024/091448A1 |
A liquid composition configured to form a transparent oleophobic and hydrophobic antimicrobial coating after application and post-cure of the liquid composition on a substrate. A transparent oleophobic and hydrophobic antimicrobial coati...
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WO/2024/090311A1 |
A light-absorbing composition according to the present invention contains: an ultraviolet ray-absorbing compound having a hydroxy group and a carbonyl group in a molecule; metal components; polyvinyl butyral; and isocyanate. At least som...
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WO/2024/091098A1 |
Provided are: cerium oxide particles for chemical mechanical polishing; and a chemical mechanical polishing slurry composition containing same. The characteristic cerium oxide particles of the present invention can be combined with a sur...
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WO/2024/091099A1 |
Provided are cerium oxide particles for chemical mechanical polishing and a chemical mechanical polishing slurry composition comprising same. A combination of the characteristic cerium oxide particles of the present invention with a cati...
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WO/2023/051858A8 |
The invention relates to a self-activating photoactive aerosol comprising an anion-containing bulk composition having a mass ratio of nitrate anions and/or nitrogen-oxygen compounds to chlorides of 1 part nitrate anions and/or nitrogen-o...
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WO/2024/084957A1 |
Provided are: a polishing method which can maintain a sufficiently high insulating-film polishing rate and selectivity and can be sufficiently inhibited from causing polishing flaws; and a method for producing a semiconductor component u...
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WO/2024/085144A1 |
The present invention provides: an allergen inhibitor that exhibits an excellent allergen inhibiting effect; and an allergen inhibition product using the allergen inhibitor. This allergen inhibitor contains an allergen inhibiting compoun...
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WO/2024/085009A1 |
The method for producing an inorganic oxide nanofiber of one embodiment of the present disclosure dissolves water, a metal alkoxide, a catalyst, and a surfactant in a protic or aprotic polar solvent to prepare a mixed solution, removes t...
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WO/2024/085217A1 |
This polishing agent composition for a plastic lens contains alumina, a water-soluble polymer compound, and water, wherein the water-soluble polymer compound is an oxazoline group-containing water-soluble polymer compound in which an oxa...
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WO/2024/085218A1 |
This polishing agent composition for a plastic lens contains alumina, polyvinyl alcohol, and water, wherein the degree of saponification of the polyvinyl alcohol is 40-98 mol%, and the degree of polymerization of the polyvinyl alcohol is...
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WO/2024/085793A1 |
Disclosed is the use of an aqueous deicing/anti-icing composition for reducing carbon fibre degradation. Said composition comprises 40-60% by weight of at least one alkali metal carboxylate and 0.1-2.0% by weight of microfibrillated cell...
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WO/2024/080235A1 |
As illustrated by fig. 1, a supply liquid-containing liquid storage tube 100 according to the present invention has a liquid supply portion 10 and a liquid storage portion 20; in the liquid storage portion 20, a supply liquid 30 and a mu...
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WO/2024/080310A1 |
The present disclosure provides a water repellent oil repellent agent which contains a polysaccharide and a sizing agent, wherein a 20% by mass aqueous solution of the polysaccharide has a viscosity of 60 cps or less at 50°C.
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WO/2024/080833A1 |
The present invention provides a slurry composition for chemical mechanical polishing and a manufacturing method therefor, wherein the slurry composition is capable of achieving a high polishing rate for low dielectric constant films rel...
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WO/2024/080076A1 |
The water-repelling/dust-repelling agent according to the present invention comprises: an ionic wax-based emulsion containing a wax component, which is a water-repelling component, and being obtained by emulsifying the wax component usin...
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WO/2024/080312A1 |
Provided are a surface treatment agent that makes it possible to form a surface layer that has excellent frictional durability, an article that has a surface layer that has excellent frictional durability, and a production method for the...
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WO/2024/080313A1 |
The present invention provides: a composition which is capable of forming a surface layer that has excellent wear resistance; a base material with a surface layer; and a method for producing a base material with a surface layer. This c...
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WO/2024/080309A1 |
The present invention provides a water repellent oil repellent agent which contains a modified starch, wherein: the modified starch contains a hydrophobized modified starch, a 20% by mass aqueous solution of which has a viscosity of 60 c...
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WO/2024/081201A1 |
The invention provides a chemical-mechanical polishing composition comprising: (a) a silica abrasive; (b) an oxidizing agent; and (c) water, wherein the chemical-mechanical polishing composition has a pH of about 2 or less. The invention...
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WO/2024/080229A1 |
The present invention is an addition-curable mold-releasing silicone composition for a silicone adhesive, the composition comprising: (A) a fluorine-containing organopolysiloxane which has at least two alkenyl groups and at least one flu...
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WO/2024/080049A1 |
The present invention is an emulsion composition of a film-forming organopolysiloxane, the emulsion composition being characterized by comprising: 100 parts by mass of (A) an organopolysiloxane which is represented by average composition...
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WO/2024/080238A1 |
As illustrated in fig. 1, a liquid storage tube 100 filled with a liquid to be supplied according to the present invention comprises a liquid supply part 10 and a liquid storage part 20. In the liquid storage part 20, a to-be-supplied li...
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WO/2024/075775A1 |
Disclosed is a polyurethane-resin-forming composition comprising a polyisocyanate prepolymer (A) and polyols (B). The polyisocyanate prepolymer (A) comprises a product of reaction between diphenylmethane diisocyanate (a1-1) and/or a diph...
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WO/2024/075779A1 |
This oil-repellent hydrophilic film composition contains a fluorine-based compound (A), a binder (B), and a thickener (C). The fluorine-based compound (A) is represented by general formula (1) or general formula (2). The binder (B) is a ...
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WO/2024/075682A1 |
[Problem] To provide a novel supercooling promoting agent. [Solution] A supercooling promoting agent containing an extract, the extract being extracted from coffee beans with an extraction solvent in the presence of superheated steam.
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WO/2024/075578A1 |
Provided is a coating agent comprising a fluoropolyether group-containing polymer composition that contains, at a specific ratio: a polymer and/or a partial (hydrolyzed) condensate (I) thereof, the polymer having a fluorooxyalkyl group a...
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WO/2024/075801A1 |
Provided is a polymer that has a repeating unit derived from a monomer (a) represented by the general formula R1-R2-(CH2)p-O-R3 (in the formula, R1 is -CH3, -CH2F, -CHF2, -CH2I, or -CHFI; R2 is a C1 to C49 alkylene group formed only from...
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WO/2024/075546A1 |
Provided is a polishing agent, a polishing method, and a method for manufacturing a semiconductor component that exhibit a good polishing speed in CMP of a surface to be polished, said surface including boron-doped silicon. The polishi...
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WO/2024/074135A1 |
Disclosed in the present invention is a method for purifying a biological dust suppressant by means of two-stage ultrafiltration, wherein a target product is separated and purified by means of two-stage ultrafiltration utilizing the diff...
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WO/2024/070832A1 |
The present invention provides a composition for finish polishing, the composition enabling efficient proceeding of etching, thereby being capable of improving the polishing rate, while maintaining the surface quality after the polishing...
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WO/2024/073209A1 |
Synthesis of cationic-modified water-soluble polysaccharide is disclosed. The cation is pendent to the polysaccharide backbone. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive com...
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WO/2024/070371A1 |
The present invention addresses the problem of providing a composition capable of forming an optical filter that has fewer aggregates. The present invention relates to a composition comprising a near-infrared absorbing dye, an alkali-s...
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WO/2024/071414A1 |
The present invention provides an article comprising a glass substrate and a siloxane layer formed by treating a surface of the glass substrate with a compound represented by formula (1) (in the formula, all the symbols have the same mea...
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WO/2024/070831A1 |
The present invention provides a polishing composition that allows etching to proceed efficiently. Provided is a polishing composition containing: silica particles as the abrasive grains; a basic compound; and water. Here, the basic comp...
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WO/2024/070866A1 |
An addition reaction-curable organopolysiloxane composition containing: (A) (A-1) an organopolysiloxane that has a silicon atom-bonded alkenyl group in one molecule and does not have a (meth)acrylic group and (A-2) an organopolysiloxane ...
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