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JPH048096U |
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JPH03129897U |
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JPH03285732A |
PURPOSE: To improve the accuracy of heating temperature of each work and the accuracy of each forged work by individually controlling heating of each work charged into each electric furnace and forging the heated works in a forging equip...
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JPH0377241B2 |
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JPH03260590A |
PURPOSE: To eliminate the loosening of a bolt and a nut and to eliminate the leakage of oxygen from a flange part by fastening an expansion joint to the flange parts being the fastening parts of a muffle main body expanding and contracti...
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JPH0372121B2 |
A method of manufacturing a cast-iron bonded diamond wheel, by using a cast iron as a bond for holding diamond particles together. After a powder mixture consisting of the diamond particles and the cast iron is molded into a desired form...
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JPH0367479B2 |
An oven is provided for the vacuum brazing of a metal such as aluminium or aluminium alloys, including a sealed enclosure having a first heating device for raising the parts to be treated to the brazing temperature, and a pumping device ...
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JPH0364569B2 |
An industrial furnace, especially a single chamber vacuum furnace, for thermally treating metal workpieces. The furnace has a heating chamber which is disposed in a furnace housing and receives a charge. The heating chamber can be heated...
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JPH0347196Y2 |
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JPH0347197Y2 |
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JPH0345936Y2 |
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JPH0345117Y2 |
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JPH0344998Y2 |
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JPH0343596Y2 |
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JPH0389394U |
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JPH03199891A |
PURPOSE: To shorten the time of temperature rise and reduce a temperature difference between the surface layer section and the inner section of a matter to be processed by a method wherein the matter to be processed, charged into a heati...
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JPH03194892A |
PURPOSE: To enrich the mechanical strength of a furnace so as to simplify the construction thereof by fixing a heating body to flange members via supporting members while making each of the supporting members of porous graphite or porous...
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JPH0345311B2 |
A radiation heating apparatus comprising a heating zone, a zone to be heated, a gas non-permeable boundary member defining the boundary between the two zones, and a porous radiator member provided in the heating zone, wherein a high-temp...
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JPH0357396U |
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JPH0320715Y2 |
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JPH0394825A |
PURPOSE: To enable reaction mass transfer by disposing metallic balls on plural trays arranged vertically apart spaced intervals and providing the trays with holes. CONSTITUTION: The charging of the substances to be treated is executed f...
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JPH0395388A |
PURPOSE: To reduce the size of an entire furnace, by constructing a cover to be rotatable with respect to a shell in a sealing manner, and providing each apparatus on the cover and disposing it just above a melting crucible. CONSTITUTION...
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JPH0337388U |
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JPH0375488A |
PURPOSE: To radiate heat from a surface facing in retort direction toward a retort's surface, by providing a porous wall between the retort and a chamber for convection heating with a gas passing holes. CONSTITUTION: After a material is ...
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JPH038959Y2 |
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JPH037868B2 |
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JPH0310195U |
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JPH032593B2 |
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JPH0263290B2 |
A cantilever tube for carrying loaded wafer boats into a diffusion furnace and confining flow of gas through the wafers includes an elongated slot extending from an open end of the tube to a predetermined region in which the wafer boats ...
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JPH0262942B2 |
A cantilever diffusion tube apparatus includes a quartz cantilever tube having a support end clamped to a laterally movable carriage mechanism and an outer end portion containing a plurality of spaced semiconductor wafers. The cantilever...
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JPH02298792A |
PURPOSE: To easily eliminate deposit and scrap at an exhaust port, by moving a casting device that moves vertically against a coagulation room where a bottom plate and a shielding device are provided inside and a refining container, in a...
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JPH02298214A |
PURPOSE: To surely heat and cool the charged substance by providing a mechanism in which a suction opening of a ventilator is selectively communicated with a charging chamber or an annular chamber by the movement of a cylinder to reduce ...
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JPH0255710B2 |
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JPH0255709B2 |
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JPH0255708B2 |
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JPH02140299U |
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JPH02282687A |
PURPOSE: To reduce the weight of a muffle device, reduce a welding part and further reduce a facility cost by a method wherein a tensile load caused by the weight of the muffle device is eliminated, and an upward compression load is appl...
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JPH0252197B2 |
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JPH02272293A |
PURPOSE: To prevent a heat loss in a heating chamber by providing a control mechanism by which the contact force of a bung against a case main body in a pressing device is regulated to a constant level at all times in accordance with the...
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JPH02267487A |
PURPOSE: To enable a vacuum induction furnace to manufacture ingots having different diameters, by forming steps in a melting pot so that the diameters of the steps may decrease toward a base. CONSTITUTION: Steps are formed in a melting ...
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JPH0240478Y2 |
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JPH0240479Y2 |
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JPH0246877B2 |
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JPH02124498U |
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JPH02250326A |
PURPOSE: To prevent a life of a core tube from being lowered by a loss at a tip part of a hydrogen-gas supply tube and to enhance a yield of a semiconductor device by a method wherein the tip part of the hydrogen-gas supply tube is made ...
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JPH02114896U |
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JPH02197792A |
PURPOSE: To eliminate the affection of the convection of pressure gas in a heating chamber effectively and permit the holding of temperatures at the upper and lower parts in the heating chamber uniformly at all times by a method wherein ...
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JPH0225120Y2 |
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JPH0224074Y2 |
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JPH0227592B2 |
The semiconductor device manufacturing process for producing semiconductors (transistor, IC, LSI or the like) needs a large number of thermal treatments for semiconductor wafers, such as thermal oxidation, diffusion, CVD, annealing or th...
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