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WO/1987/004533A1 |
A process for forming a colored image, which comprises imagewise exposing a color paper having at least one light-sensitive layer containing a core/shell type surface latent image-forming, substantially silver iodide-free monodispersed s...
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WO/1987/004272A1 |
A photosensitive material for screen process prepared by coating a plastic film with a photo-sensitive composition (A) comprising a water-soluble or water-dispersible polymer or copolymer, an unsaturated compound having a photopolymeriza...
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WO/1987/004273A1 |
A photosensitive emulsion which contains an emulsion containing a film-forming polymer compound and a photo-crosslinkable polyvinyl alcohol partly having one photo-crosslinkable structural unit, and which further contains: 1) an aliphati...
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WO/1987/003874A1 |
Spiropiperidinenaphtoxazine compounds represented by general formula (I) are useful as photochromic compounds, wherein (a) R1 represents a C1-18 alkyl group, an optionally substituted C7-15 aralkyl group, a C1-10 alkenyl group, or an opt...
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WO/1987/003706A2 |
A radiation sensitive device comprising a substrate carrying a radiation sensitive layer is coated with a discontinuous covering layer which is more light sensitive than the radiation sensitive layer. The covering layer is formed by spra...
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WO/1987/003541A2 |
Novel color-forming di- and triarylmethane compounds possessing certain S-containing ring-closing moieties, namely, a thiolactone, dithiolactone or thioether ring-closing moiety, to certain metal salts thereof and to a method of synthesi...
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WO/1987/003108A1 |
A photochromic material made of a thin film of a montmorillonite interlayer compound which contains, as guests, organometallic complex ions that can accept electrons under an optically excited condition. A photochromic element comprising...
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WO/1987/003086A1 |
An ultraviolet-sensitive composition comprising a photo-activatable agent capable of forming a radical upon being irradiated with UV rays, a color-changing agent which undergoes a visible change in color by the action of the radical, and...
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WO/1987/002048A1 |
Phenazine dyes, more particularly, phenazine dyes suitable as intermediates for leuco phenazine dyes. Essentially all of the phenazine dyes capable of providing red, orange, and magenta hues have unsubstituted amine groups at the 3- or 7...
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WO/1987/001827A2 |
A method for acid etching or sandblasting decorative designs in the smooth surface of hard substrates such as glass, ceramics, plastics, and marble, granite, or other stones. A dry film photoresist, preferably a solder mask, is applied t...
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WO/1987/001824A1 |
A thermally developable photographic material capable of being developed by a dry heat processing to provide an image. It contains a core/shell type of light-sensitive silver halide grains having a silver iodide content of 4 to 40 mol % ...
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WO/1987/001825A1 |
An image receptive film comprising a surface layer containing a photosensitive polyacetylenic compound having at least two acetylenic linkages in a conjugated system is subjected to a plurality of radiant energy exposures each limited to...
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WO/1987/001213A1 |
A photosensitive resin solution is supplied into a cylinder which is rotated at a high speed, so that the photosensitive resin solution is uniformly adhered onto the inner surface of the cylinder due to centrifugal force and is solidifie...
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WO/1987/000524A2 |
A compound having general formula (I) in which the following designations are used: R1 = one to four substituents from the series -Z, -OZ, -NZ2, -NH2,- NH2, -CN, -CF3, where Z = C1-C5 alkyl, phenyl, pyridyl, benzyl. R2 = -H, -Z, -CH2Z. R...
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WO/1987/000341A1 |
An optical recording device includes a crystal selected from the group of alkali metal halides or alkali-earth halides and is doped with an alkali metal dopant and negative hydride ions to form a doped crystal. The doped crystal is forme...
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WO/1986/007473A1 |
Composition and method for enhancing the contrast of images of an underlying photolithographic layer. A photographic element, including a photoresist layer,is applied to a substrate. The photoresist layer contains a contrast-enhancing la...
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WO/1986/007471A1 |
The present arrangement includes a first tape leader (11) which can be readily and automatically coupled to a second tape leader (23). In a preferred embodiment the first tape leader is connected to be wound on a take up reel while the s...
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WO/1986/007171A1 |
Metallic salts of organic charge-transfer agents, such as TCNQ, TNAP, TCNE and DDQ and their derivatives, can be processed by an electron beam (22) for a variety of useful electronic and optical applications. The metallic charge transfer...
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WO/1986/005600A1 |
A photomechanical method for forming pressure sensitive dry transfer reproductions of color images, either single color or multicolor. A base release lacquer (14) is applied to a substrate (12) and dried, a one color ink layer (20) is ap...
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WO/1986/005286A1 |
Light sensitive recording medium is exposed to highly absorbed incoherent light either before or after a slant fringe hologram is recorded therein to reduce the sensitivity of the medium at surface regions adjacent a supporting substrate...
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WO/1986/005285A1 |
A layer of material having relatively low light sensitivity is interposed between a substrate and a light sensitive recording medium during recording of a slant fringe hologram. The layer frees the ends of the fringes from the substrate ...
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WO/1986/004695A1 |
A new method for fabricating a device, such as a semiconductor device. The method includes the step of patterning a substrate (e.g. 10) with a trilevel resist (e.g. 30) containing a spin-deposited substitute (e.g. 50) for the conventiona...
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WO/1986/004694A1 |
A silver halide photographic photo-sensitive material, in which a highly immobile novel arylidenebis type of dye which selectively dyes a specific layer and does not diffuse into other layers is incorporated in a hydrophilic colloidal la...
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WO/1986/003852A1 |
A holographic recording medium is treated to eliminate side lobes. The method involves exposing opposed surfaces of the medium with filtered incoherent light either before or after a holographic exposure with coherent light. The incohere...
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WO/1986/003853A1 |
A holographic recording medium is treated to reduce or eliminate unwanted extraneous diffraction and flare. Regions adjacent surfaces of the medium are desensitized to reduce contrast in the holographic fringe pattern along the surfaces,...
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WO/1986/002766A1 |
A reduced friction composite sheet construction comprises a semicrystalline polymeric sheet support having a first and second surface, said surfaces having in the range of 5 to 99 percent crystalline polymeric material and 1 to 95 percen...
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WO/1986/002744A1 |
A new method for fabricating a device lithographically patterning nonplanar substrates. In accordance with this method, a nonplanar substrate surface is patterned by initially substantially conformably coating the surface with a resist. ...
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WO/1986/002264A1 |
Preparation of systems of inverted micellae (also called oil and water micro-emulsion), by using oil and other biocompatible liquids as solvents and a process to thicken these fluid systems or to transform them into a gel; and the use of...
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WO/1986/002087A1 |
A surface coated article comprising a substrate with a cured polyethylene oxide-based coating thereupon. The essential features of the article are that the coating essentially consists of polyethylene oxide chains, with one free end and ...
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WO/1986/001914A1 |
An improved photolithographic process for manufacturing an electrical device, such as an integrated circuit device, which comprises coating a material (30) with a positive photosensitive coating layer (40) containing an unbleachable abso...
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WO/1986/001616A1 |
Process for fabrication of devices utilizing novel extremely useful compositions for delineation of materials. These compositions include a polymer having segments that are at least (10) monomer units long of a first entity and segments ...
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WO/1986/001505A1 |
A light sensitive diazo composition comprising at least one light-sensitive diazonium compound of formula (I) and at least one azo coupling component of formula (II).
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WO/1986/001313A1 |
In a process for forming a layer of patterned photoresist on a semiconductor substrate (10), a first, thin layer (12) of polymeric photoresist is formed on the substrate and, using a first mask (16, 18), selected regions (22) of the laye...
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WO/1986/001010A1 |
A photosensitive element suitable for manufacture of an external nameplate comprises a substrate carrying a cured non-etchable background surface, an etchable curable polymeric layer that can be etched imagewise to provide an image viewa...
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WO/1986/000572A1 |
An easily bondable polyester film comprising a polyester base film having on one side a coating layer of a mixture mainly composed of a copolyester containing ester-forming alkali metal aromatic sulfonate as one comonomer and a higher fa...
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WO/1986/000151A1 |
In a method of photolithography in which optical radiation is directed onto a layer of photoresist coated on a substrate, the tendency towards generation of spurious image features is much reduced by selecting the substrate and the optic...
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WO/1986/000150A1 |
A process for preparing a silver halide photographic emulsion, which comprises adding additives capable of being deactivated with an oxidizing agent, such as a dye, a sensitizer, an aid to be used in gold sensitization, or the like to th...
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WO/1985/005470A1 |
Excellent resolution in the lithographic fabrication of electronic devices is achieved with a specific bilevel resist. This bilevel resist includes an underlying layer (e.g. 5) formed with a conventional material such as a novolac resist...
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WO/1985/005194A1 |
Method of pretreating a semiconductor wafer so that a solution coating of a positive resist of poly(methacrylic anhydride) can be directly applied to the treated surface. A typical semiconductor wafer of silicon is first precoated with a...
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WO/1985/004748A1 |
An optical body, such as a disc, including upon a support a medium having both a continuous phase (e.g., 5) and a non-continuous phase (e.g., 7) yields excellent contrast and stability for optical recording purposes. Exemplary of materia...
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WO/1985/004025A1 |
An alkaline aqueous tanning developing solution for photographic image development comprising at least one hydroxylamine derivative, preferably also containing at least one water miscible polyhydroxy aliphatic organic solvent.
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WO/1985/004026A1 |
Method for making an integrated circuit device which comprises coating a reflective layer (10) with an antireflective coating (12) comprising a layer of indium arsenide before applying a layer of photosensitive material or photoresist (1...
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WO/1985/002687A1 |
The coating consists of a lacquer comprising one or a plurality of phototropic substances. The lacquer may have a plurality of layers of which the phototropic coloration may differ. The optical element may further comprise one or a plura...
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WO/1985/002619A1 |
Compounds having the general formula (I), wherein R1, R2 and R3 represent one or a plurality of components of the series -H, -CN, -SCN, - NO2, -X, -CH2X, -CX3 (X = halogen), -OR, -SR, -COR, -COOR (R = H, alkyl with up to 8 atoms of C, ar...
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WO/1985/001732A1 |
Heteropentathiepins including pyrazolopentathiepins substituted in the 8-position; intermediate pyrazolo-1,2,3-thiadiazoles, pyrazolothiazathiolium chlorides, and 5-substituted aminopyrazoles; process for making the pentathiepins by reac...
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WO/1985/000142A1 |
The invention (Figures 1-10) relates to high energy beam-sensitive glass article exhibiting insensitivity and/or inertness to actinic radiation, i.e., glass articles which are darkened and/or colored within a thin surface layer of, e.g.,...
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WO/1984/003169A1 |
Optical devices using an organic charge transfer salt as the switching and storage media. Generally, a light beam (26) of a given intensity directed to a film of certain organic charge transfer salts (20) causes the illuminated area (28)...
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WO/1984/002986A1 |
A bilevel photoresist system (10) of two organic photoresists, both sensitive to deep ultraviolet (UV) radiation from the same deep UV source (e.g., Xe-Hg) and suitable for use in patterning a substrate of high reflectivity in the deep U...
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WO/1984/002587A1 |
An aqueous coating composition comprises (a) a hydrophilic binder, (b) a water-soluble salt of a polycarboxylic acid ester of cellulose having at least 8 acyl groups per C24 cellulose unit wherein a majority of the acyl groups are alipha...
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WO/1984/002289A1 |
An optical data storage system is contemplated, one employin a data-modulated writing laser beam (Fig. 2; L) and a non-erasing reading laser beam of predetermined wavelength. Improved optical media (Fig. 2) for such systems are described...
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