Title:
【発明の名称】薄いフィルムの視射角蒸着
Document Type and Number:
Japanese Patent JP2002509188
Kind Code:
A
Abstract:
A method of making vapor deposited thin films by rotating a substrate in the presence of an obliquely incident vapor flux. The substrate is rotated about an axis normal to the surface of the substrate while depositing a vapor flux, and then paused while depositing vapor flux to cause columns of a thin film to grow obliquely. The resulting thin film exhibits a porosity that is not dependent on the column angle of the resulting thin films.
Inventors:
Roby, Kevin Jay
Brett, Michael Jay
Brett, Michael Jay
Application Number:
JP2000505345A
Publication Date:
March 26, 2002
Filing Date:
July 29, 1998
Export Citation:
Assignee:
The Governor's of the University of Alberta
International Classes:
C03C17/00; C23C14/22; G02B5/28; C23C14/24; C23C14/50; (IPC1-7): C23C14/24; G02B5/28
Attorney, Agent or Firm:
Tadahiko Ito