Title:
【発明の名称】粗面化白金層を有するキャパシタ、白金の粗面化層を形成する方法、及びキャパシタを形成する方法
Document Type and Number:
Japanese Patent JP2002524655
Kind Code:
A
Abstract:
In one aspect, the invention includes a method of forming a roughened layer of platinum, comprising: a) providing a substrate within a reaction chamber; b) flowing an oxidizing gas into the reaction chamber; c) flowing a platinum precursor into the reaction chamber and depositing platinum from the platinum precursor over the substrate in the presence of the oxidizing gas; and d) maintaining a temperature within the reaction chamber at from about 0° C. to less than 300° C. during the depositing. In another aspect, the invention includes a platinum-containing material, comprising: a) a substrate; and b) a roughened platinum layer over the substrate, the roughened platinum layer having a continuous surface characterized by columnar pedestals having heights greater than or equal to about one-third of a total thickness of the platinum layer.
Inventors:
Marsh, Eugen, Pee.
Application Number:
JP2000568109A
Publication Date:
August 06, 2002
Filing Date:
August 27, 1999
Export Citation:
Assignee:
Micron Technology, Ink.
International Classes:
C23C16/18; H01G4/005; H01L21/02; H01L21/822; H01L23/532; H01L27/04; (IPC1-7): C23C16/18; H01L21/822; H01L27/04
Attorney, Agent or Firm:
Masanori Ishihara (1 person outside)