Title:
【発明の名称】微細パターン形成方法
Document Type and Number:
Japanese Patent JP2002543582
Kind Code:
A
Abstract:
In a method for forming a micro-pattern on a substrate (200), polymer material having a solvent is coated on the substrate, thereby forming a polymer film on the substrate. Then, a mold (204) having a predetermined shape is compressed into the polymer film (202) on the substrate by employing a predetermined compression technique to entail a plastic deformation of the polymer film, thereby patterning the polymer film. This compression procedure is performed at a room temperature, e.g., of about 10 to about 30° C. In the present invention, before the mold (204) is pressed into the polymer film (202), a free volume in the polymer film is previously increased so that a pressure applied on the polymer material needed to plastically deform the polymer film is reduced. Thereafter, etching is performed on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate.
Inventors:
Lee, Hong Hie
Kang, Dar Yang
Kang, Dar Yang
Application Number:
JP2000614090A
Publication Date:
December 17, 2002
Filing Date:
April 20, 2000
Export Citation:
Assignee:
MINUTA TECHNOLOGY CO., LTD.
International Classes:
H01L21/30; B29C43/54; G03F7/00; H01L21/027; G03F7/16; (IPC1-7): H01L21/30
Domestic Patent References:
| JPH0339229A | 1991-02-20 | |||
| JPS61103645A | 1986-05-22 | |||
| JPH02293850A | 1990-12-05 | |||
| JPS63231331A | 1988-09-27 | |||
| JPH0580530A | 1993-04-02 | |||
| JPH02161636A | 1990-06-21 |
Foreign References:
| US6284345B1 | 2001-09-04 | |||
| US5900160A | 1999-05-04 | |||
| EP0091651A2 | 1983-10-19 |
Attorney, Agent or Firm:
Takehiko Suzue (4 outside)