Title:
【発明の名称】プラズマラジカルに基板を曝露する装置及び方法
Document Type and Number:
Japanese Patent JP2002543584
Kind Code:
A
Abstract:
An apparatus and method for exposing a substrate to plasma including a first reaction chamber adapted to generate a plasma comprising ions and radicals and a second reaction chamber coupled to the first reaction chamber and adapted to house a substrate at a sight in the second reaction chamber. The second reaction chamber is coupled to the first reaction chamber by an inlet member and radicals of the plasma flow through the inlet member into the second reaction chamber.
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Inventors:
Noble, David, Bee.
Jarepary, Ravi
Dusty, Nathan
Minor, gary
Sahin, Targat
Shin, Guan Sai
Bashnagar, Yashraju
Jarepary, Ravi
Dusty, Nathan
Minor, gary
Sahin, Targat
Shin, Guan Sai
Bashnagar, Yashraju
Application Number:
JP2000614482A
Publication Date:
December 17, 2002
Filing Date:
April 21, 2000
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H05H1/46; C23C8/36; C23C14/48; C23C16/452; H01J37/32; H01L21/02; H01L21/26; H01L21/31; H01L21/318; (IPC1-7): H01L21/31; C23C14/48; H01J37/32; H01L21/02; H01L21/26; H01L21/318; H05H1/46
Domestic Patent References:
| JPH0992643A | 1997-04-04 | |||
| JPH03212938A | 1991-09-18 | |||
| JPH0645320A | 1994-02-18 | |||
| JPH0864390A | 1996-03-08 | |||
| JPH0823095A | 1996-01-23 | |||
| JPH1079509A | 1998-03-24 |
Attorney, Agent or Firm:
Yoshiki Hasegawa (2 outside)