Title:
【発明の名称】物質投与用インプラント及びインプラントの製造方法
Document Type and Number:
Japanese Patent JP2003513001
Kind Code:
A
Abstract:
Resorbable porous or polycrystalline silicon implants impregnated with a beneficial substance can be used for slow release of a substance over a long time. Porous or polycrystalline implants, particularly of silicon, impregnated with a beneficial substance are new. Independent claims are included for the following: (a) a method of impregnating a porous semiconducting material with a substance by allowing molten impregnate substance to pass into the pores of the semiconductor; (b) implants having a large number of holes which contain beneficial substance and which are closed by bio erodable doors of different thickness, to stagger the release of the beneficial substance over time as the doors are breached.
Inventors:
Lee Nam Trevor
Ballet, Christopher Paul
Bow Day Titch, Andrew Paul
Cocks, Timothy Ingram
Wright, Peter Jiyoung
Ballet, Christopher Paul
Bow Day Titch, Andrew Paul
Cocks, Timothy Ingram
Wright, Peter Jiyoung
Application Number:
JP2000544305A
Publication Date:
April 08, 2003
Filing Date:
April 16, 1999
Export Citation:
Assignee:
Kinetic Limited
International Classes:
A61K9/00; A61K31/00; A61K33/00; A61K47/02; A61K47/34; A61L27/00; (IPC1-7): A61K9/00; A61K47/02; A61K47/34; A61L27/00
Foreign References:
| WO1997006101A1 | 1997-02-20 | |||
| WO1998000107A2 | 1998-01-08 |
Attorney, Agent or Firm:
Yoshio Kawaguchi (4 outside)