Title:
【発明の名称】過酸化水素溶液のより高度の精製方法
Document Type and Number:
Japanese Patent JP2003535007
Kind Code:
A
Abstract:
The invention relates to a novel chromatographic process for the further purification of hydrogen peroxide solutions, giving high-purity solutions which can be employed in semiconductor technology under today's high purity requirements.
Inventors:
Oeter, Dietmar
Dusemund, Claus
Neumann, Ewald
Fries slah, claus
Hostalek, Martin
Dusemund, Claus
Neumann, Ewald
Fries slah, claus
Hostalek, Martin
Application Number:
JP2001588128A
Publication Date:
November 25, 2003
Filing Date:
March 29, 2001
Export Citation:
Assignee:
Merck Patent Gesellschaft Mitt Beschlenktel Haftung
International Classes:
B01D15/00; B01D15/02; B01D15/04; B01D15/08; B01J20/26; B01J20/281; B01J41/04; B01J41/14; C01B15/013; (IPC1-7): C01B15/013; B01D15/00; B01D15/02; B01D15/04; B01D15/08; B01J20/26; B01J41/04; B01J41/14
Domestic Patent References:
| JPS63156004A | 1988-06-29 | |||
| JP2000128510A | 2000-05-09 | |||
| JPH0840708A | 1996-02-13 | |||
| JPH0964001A | 1997-03-07 |
Attorney, Agent or Firm:
Nobuyuki Kaneda (2 others)