Title:
表面から汚染物質を除去する方法およびそのために有用な組成物
Document Type and Number:
Japanese Patent JP2004531637
Kind Code:
A
Abstract:
Particulate and metal ion contamination is removed from a surface, such as a semiconductor wafer containing copper damascene or dual damascene features, employing a fluo-ride-free aqueous composition comprising a dicarboxylic acid and/or salt thereof; and a hydroxycarboxylic acid and/or salt thereof or amine group containing acid.
Inventors:
Emile A near
Application Number:
JP2003509052A
Publication Date:
October 14, 2004
Filing Date:
June 17, 2002
Export Citation:
Assignee:
Air Products and Chemicals Incorporated
International Classes:
B08B3/08; C09K13/00; C09K13/06; C11D7/26; C11D11/00; C23G1/10; H01L21/02; H01L21/304; H01L21/321; (IPC1-7): C11D7/26; B08B3/08; C09K13/06; H01L21/304
Attorney, Agent or Firm:
Masatake Shiga